The deposition of diamond-like carbon (DLC) films at atmospheric pressure is a promising technique of achieving in-process coatings regardless of work size. In this study, we aimed at the synthesis of DLC films at atmospheric pressure by nanopulse chemical vapor deposition (CVD) using a unique power source system consisting of a static induction (SI) thyristor and an inductive energy strage (IES). Then, we realized the synthesis of DLC films in open air (101 kPa). The deposition rate was as high as 0.4 µm/min, and the hardness of the film was 20.6 GPa. From Raman spectroscopic analysis results, the quality of films was found to significantly depend on input voltage and deposition time.
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