Evaluation of Nanopulse Plasma and its Application to DLC Film Deposition

Saito, Takao; Kondo, Yasuhisa; Terazawa, Tatsuya; Saito, Masanori; Ohtake, Naoto

doi:10.1541/ieejfms.126.157

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Cited by 2 publications

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“…The configuration of the apparatus in this experiment is the same as that of the apparatus used in nanopulse plasma CVD. 15) A hollow magnetic cylinder made of stainless steel was used as the substrate holder. The inner and outer diameters of the substrate holder were 25 and 100 mm, respectively.…”

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Rapid Growth of Diamond-like Carbon Films by Nanopulse Magnetron Chemical Vapor Deposition

Saito

Kondo

et al. 2007

jjap

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In this paper, we describe the development of a rapid deposition method for diamond-like carbon (DLC) films. The deposition rate of DLC films is investigated using magnetic field enhanced nanopulse plasma chemical vapor deposition (CVD). The maximum deposition rate of DLC films produced by this magnetron CVD is approximately fifty times larger than that of the same films produced by conventional plasma CVD. The area of DLC films having a high deposition rate corresponds to the region of the magnetic field distribution where the field is parallel to the substrate at heights of 15 -20 mm.

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“…It was experimentally proved that a nanopulse generator can be used to deposit DLC films, although the width of the pulse it generates is significantly less than that of the conventional micropulse power supply used in plasma CVD. 14,15) Four representative configurations of magnets were examined in this study. These configurations are shown in Fig.…”

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confidence: 99%