An investigation into strongly organosilicon plasma‐polymeric coatings has been performed with the goal of developing a deeper understanding of the relationship between the physical properties and the chemical structure. The overall elemental composition has been analyzed using X‐ray photoelectron spectroscopy (XPS) and micro elemental analysis. Additional XPS peak fitting and Fourier‐transform infrared spectroscopy analysis have been undertaken and physical properties such as Young's modulus and mass density have been determined. The chemical structure of the coatings is discussed taking into account conventional Si–O crosslinking and also an independent second bridge‐building mechanism. Based on this suggestion, a least‐squares algorithm has been used to calculate the network structure including a new index for the degree of crosslinking. This enables very similar plasma‐polymeric coatings to be distinguished.

A plasma probe and measuring method were developed to simultaneously determine both the electron density, n e , and floating potential in plasmaenhanced chemical vapor deposition (PECVD) coating processes within lowpressure plasmas. The functionality of the probe with a high deposition rate is demonstrated on the basis of examples using hexamethyldisiloxane as a precursor gas. The results show that the developed probe can determine both the n e (∼10 15 m −3) and the time-varying floating potential. The results also indicate that the probe is effective for monitoring the changes in the plasma condition caused by the pressure and the gas flow rate during the coating process. This method can contribute to confirm the process and chamber conditions in PECVD processes.

No abstract