The smallest catalyst: A new strategy to control chemical synthesis by exposure to low-energy electrons relies on the electrostatic attraction caused by the soft ionization of one of the reaction partners. This approach was used to induce a reaction between C(2)H(4) and NH(3) yielding aminoethane. The reaction resembles a hydroamination except that the electron beam replaces the catalyst used in the organic synthesis.

Self-assembled monolayers (SAMs) of 10-undecene-1-thiol on Au were functionalized with nitrogen-containing groups using an approach in which multilayer ammonia (NH(3)) films were deposited at low temperature onto the SAMs and subsequently exposed to 15 eV electrons. The result of this process was investigated after removal of the remaining NH(3) by annealing to room temperature using high-resolution electron energy loss spectroscopy (HREELS) and X-ray photoelectron spectroscopy (XPS). HREELS shows that the CC double bonds disappear during electron exposure, while XPS gives evidence that about 25% of the terminal double bonds of the SAM were functionalized. Also, XPS shows that a sufficiently thick NH(3) layer protects the underlying SAM from electron-induced damage. The process suggested here thus represents a particularly gentle approach to the functionalization of ultrathin molecular layers. Thermal desorption spectrometry (TDS) and electron-stimulated desorption (ESD) experiments on condensed layers of NH(3) reveal production of N(2) but show that significant amounts of the initial NH(3) as well as N(2) produced during electron exposure desorb. Hydrogen released upon formation of N(2) is held responsible for the reduction of double bonds and protection of the SAMs from damage.

Dissociative electron attachment (DEA) to gaseous formamide, HCONH(2), has been investigated in the energy range between 0 eV and 18 eV using a crossed electron/molecule beam technique. The negative ion fragments have been comprehensively monitored and assigned to molecular structures by comparison with the results for two differently deuterated derivatives, namely 1D-formamide, DCONH(2), and N,N,D-formamide, HCOND(2). The following products were observed: HCONH(-), CONH(2)(-), HCON(-), OCN(-), HCNH(-), CN(-), NH(2)(-)/O(-), NH(-), and H(-). NH(2)(-) was also separated from O(-) by using high-resolution negative ion mass spectrometry. Four resonant dissociation channels can be resolved, the strongest ones being located between 2.0 and 2.7 eV and between 6.0 and 7.0 eV. CN(-) as the most abundant fragment and HCONH(-) are the dominant products of the first of these two resonances. The most important products of the latter resonance are NH(2)(-), CN(-), H(-), CONH(2)(-), and OCN(-). It is thus found that the loss of neutral H is a site-selective process, dissociation from the N site taking place between 2.0 and 2.7 eV while dissociation from the C site occurs between 6.0 and 7.0 eV. The suitability of these reactions and thus of formamide as an agent for electron-induced surface functionalisation is discussed.

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