z Japan Synchrotron Radiation Research Institute (SPring-8) Kouto, Hyogo 679-5198, JapanFluorine-containing indium tin oxide (F-ITO) sputtering targets were prepared using spark-plasma-sintering (SPS) process. The initial powder, which was prepared by reacting ITO with HF, was sintered to the 10 cm-disks with nearly 90% of the theoretical density by the SPS process. The resulting disks were consisted of ITO and InOF, and the fluorine content was about 4 at.%. Using the F-ITO disks as sputtering target, thin films were deposited on the glass substrates. The electrical conductivity and optical transmission of the deposited films were comparable to those of the conventional ITO films, while the surface roughness of the films was much improved. P. Gouma-contributing editor

We propose a two‐step effective medium theory to predict the optical properties of anodized alumina films based on the assumption that spherical aluminum particles are distributed in columnar structures within an anodized alumina film (distributed metallic column model). Using this model, theoretical parameters such as the volume ratio and distribution range of alumina particles were determined by fitting the experimental values and their dependencies on the anodization condition were evaluated. Using the above results, the optical constants of the alumina films were calculated. © 1998 Scripta Technica, Electron Comm Jpn Pt 2, 81(3): 23–28, 1998

In order to form a polarizing alumina film by low‐temperature anodization, the anodization voltage and concentration of sulfuric acid were optimized. It was found that when pulsed anodization was used instead of a constant anodization voltage, the substrate was efficiently cooled and the quality of the anodized film was improved. The polarizing alumina film was used as a bulk polarizer. © 1998 Scripta Technica, Electron Comm Jpn Pt 2, 81(3): 17–22, 1998

In order to form a polarizing alumina film by lowtemperature anodization, the anodization voltage and concentration of sulfuric acid were optimized. It was found that when pulsed anodization was used instead of a constant anodization voltage, the substrate was efficiently cooled and the quality of the anodized film was improved. The polarizing alumina film was used as a bulk polarizer.