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Silicon quantum dot spin qubits have great potential for application in large-scale quantum circuits as they share many similarities with conventional transistors that represent the prototypical example for scalable electronic platforms. However, for quantum dot formation and control, additional gates are required, which add to device complexity and, thus, hinder upscaling. Here, we meet this challenge by demonstrating the scalable integration of a multilayer gate stack in silicon quantum dot devices using self-alignment, which allows for ultra-small gate lengths and intrinsically perfect layer-to-layer alignment. We explore the prospects of these devices as hosts for hole spin qubits that benefit from electrically driven spin control via spin–orbit interaction. Therefore, we study hole transport through a double quantum dot and observe current rectification due to the Pauli spin blockade. The application of a small magnetic field leads to lifting of the spin blockade and reveals the presence of spin–orbit interaction. From the magnitude of a singlet-triplet anticrossing at a high magnetic field, we estimate a spin–orbit energy of ∼37μeV, which corresponds to a spin–orbit length of ∼48 nm. This work paves the way for scalable spin-based quantum circuits with fast, all-electrical qubit control.

A dual mode device behaving either as a field-effect transistor or a single electron transistor (SET) has been fabricated using silicon-on-insulator metal oxide semiconductor technology. Depending on the back gate polarisation, an electron island is accumulated under the front gate of the device (SET regime), or a field-effect transistor is obtained by pinching off a bottom channel with a negative front gate voltage. The gradual transition between these two cases is observed. This dual function uses both vertical and horizontal tunable potential gradients in non-overlapped silicon-on-insulator channel