Platinum silicide Schottky diodes formed on films of polycrystalline Si doped by phosphorus are demonstrated to be efficient and manufacturable CMOS-compatible temperature sensors for microbolometer detectors of radiation. Thin-film platinum silicide/poly-Si diodes have been produced by a CMOS-compatible process on artificial Si 3 N 4 /SiO 2 /Si(001) substrates simulating the bolometer cells. Layer structure and phase composition of the original Pt/poly-Si films and the Pt silicide/poly-Si films synthesized by a low-temperature process have been studied by means of the scanning transmission electron microscopy; they have also been explored by means of the two-wavelength X-ray structural phase analysis and the X-ray photoelectron spectroscopy. Temperature coefficient of voltage for the forward current of a single diode is shown to reach the value of about −2 %/°C in the temperature interval from 25 to 50 °C.

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The effect of pressure on the galvanomagnetic properties of electronirradiated n-Pb, , Sn, Se (0.07SxS0.125) has been investigated. The electron concentration as a function of pressure is used t o determine the parameters of the band of radiation-induced resonant states and t o reconstruct the energy spectrum of Pb,.Sn,Se alloys irradiated with electrons.

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