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Abstract. The purpose of this work was to research the resistance of thin coatings to the effects of corpuscular radiation, as well as evaluation speed etching of diamond-like films with different content of diamond phase. There were two samples of monocrystalline silicon with DLC coating. To evaluate the resistance, two groups of grooves were etched on each sample. The depth was then measured to calculate a relative etching ratio of DLC coating. The resistance was determined to be four times that of silicon.

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