Articles you may be interested inNote: Binding energy scale calibration of electron spectrometers for photoelectron spectroscopy using a single sample Rev. Sci. Instrum. 82, 096107 (2011); 10.1063/1.3642659 Experimental setup for low-energy laser-based angle resolved photoemission spectroscopy Rev. Sci. Instrum. 78, 053905 (2007); A new compact 60 kV Mott polarimeter for spin polarized electron spectroscopy Rev.We show that it is possible to use a multichannel electron detector in a zone plate based photoemission spectromicroscopy in a snap shot mode to reduce the total acquisition time for a given counting time by 50% relative to the standard scanning mode while preserving the feature of the spectra. We describe the result of tests performed at Elettra using its microbeam ͑150 nm͒ together with a 48-channel detector designed for the PHOIBOS 100 analyzer optimized for extremely small x-ray sources. We also give a short summary of the technical features of the detector and describe one possible calibration procedure for its use in the snap shot mode. We show initial results from using this device to perform chemical maps of surfaces at a resolution of 150 nm.

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Low lying electronic states of rare gas-oxide anions: Photoelectron spectroscopy of complexes of O − with Ar, Kr, Xe, and N 2 Photoelectron spectroscopy of adsorbed Xe (PAX) was used to characterize various PtlTi0 2 ( 100) surfaces on an atomic scale. The PAX data provide useful information on both geometrical and electronic states of various surface sites. For example, both Ar ion sputtering and high temperature annealing (850°C) in vacuum produce a distribution of (high charge density) surface defect sites, most likely Ti3+ and Ti2+, whose local surface potentials are higher than on a stoichiometric Ti0 2 surface by 0.5 and 1 eV, respectively. Submonolayer deposits of Pt on a stoichiometric Ti0 2 exhibits much lower local surface potentials (0.5-1 eV) than sputterroughened bulk Pt, suggesting modified charge densities at these sites.

Dctliccite(1 to Profcssor Otto R R~~M M E R on his G5t'l l)irth(lny Ttic selectivity of t h e sputtering process of Cii-Ni and Ag-Ptl allovs with different biilk coiirpositions (luring Ar+-, N$-and He+-ion bornhardmezit was stutlietl b y t h e help of Auger electron spectroscopy. It was found t h a t for Cn-Ni alloys a Ni-enrichinent and for Ag-Ptl alloys a Pd enrichment takes place compared with bulk composition. T h e selectivity of t h e sputtering process decreases with decreasing sputtering ion mass. This result was explained in t h e case of Cu-Ni alloys on t h e base of t h e dependence of eleinental sputtering coefficients on t h e sputtering ion mass.Die Selektivitiit des Sputterprozesses beim Beschulj von CiI-Niuntl Ag-P(I-Legierungeii verschietlener Voluinenzusaniinensetzung mit Ar+-, N$und He+-Ionen ( E = 2 keV) wiirde mit Hilfe der Aiigerelektronenspektroskopie untersucht. Es wircl eine Ni-Anrnicherung a n der Olierfliiche der Cu-Ni-Legierungen nnd eine Pd-Anreichernng fiir die Ag-Pd-Legierungen in1 Vergleich mr Volnmenxrisarnriiensetziing gefrinden. Die Selektivitiit tics Spiitterprozesses niniiiit niit kleiner werdender Beschuljionenmassc ah. Dieses Resultat wirtl fiir Cu-Ni-Lcgierungen arif der Basis der Ahhiingigkeit der Eletiientspiitterkoeffizienten von tlcr S~~iitteriotienmasse gcdentet.

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