Articles you may be interested inSelective etching and polymer deposition on InP surface in reactive ion etching with a mixture of methane and hydrogen J.Photoluminescence characterization of InP surface reactive ion etched by a gas mixture of ethane and hydrogen

Ion beam etching has been successfully applied to InP using an Ar/O2-gas mixture. Varying angles of beam incidence resulted in different shapes of the etched profiles with the achievement even of undercutting. Good selectivity with respect to Novolak-type photoresists prevails at higher accelerating voltages.

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Optical Emission Spectroscopy (OES) with argon actinometry has been used to study the influence of machine parameters on the composition of a BCl3 RF plasma discharge in the absence and presence of aluminium. Two steady state models are proposed to account for the appearance of the various species seen, and to explain their relative abundances in response to changes in power and pressure. The validity of the actinometric technique for measuring relative changes in ground state concentrations is discussed also.