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In this work, the GAA silicon nanosheet MOSFETs basic parameters are evaluated for different channel lengths at high temperatures. The devices showed a subthreshold swing near the theoretical limit, low temperature variation on threshold voltage (dVTH/dT = -0.4 mV/ºC) and low drain induced barrier lowering (DIBL = 50 mV/V at 200ºC), both for n-type device. The devices achieved an intrinsic voltage gain around 33 dB for the worst case (channel length of 28 nm), showing that this device is a promising technology for the 7 nm node of the MOS roadmap.

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