Articles you may be interested inOptimization of the semiconductor-metal transition in VO2 epitaxial thin films as a function of oxygen growth pressure Appl. Phys. Lett. 104, 081913 (2014); 10.1063/1.4866806 Improved metal-insulator-transition characteristics of ultrathin VO2 epitaxial films by optimized surface preparation of rutile TiO2 substrates Appl. Phys. Lett. Comprehensive study of the metal-insulator transition in pulsed laser deposited epitaxial VO2 thin films J. Appl. Phys. 113, 043707 (2013); 10.1063/1.4788804 Geometric confinement effects on the metal-insulator transition temperature and stress relaxation in VO2 thin films grown on silicon J. Appl. Phys. 109, 063512 (2011); 10.1063/1.3556756In situ x-ray diffraction studies on epitaxial VO 2 films grown on c-Al 2 O 3 during thermally induced insulatormetal transition
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.