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We have investigated the friction-coefficient properties of silicon carbon nitride (SiCN) films deposited on stainless steel substrates and the adhesion properties of SiCN films deposited on Si(100). The SiCN films were deposited by hot-wire chemical vapor deposition using hexamethyldisilazane and ammonium. It was found that SiCN coating was able to effectively reduce the frictional coefficient of the stainless steel substrates. The adhesion strength was measured by surface-interface physical property analysis equipment (SAICAS) and was found to be 45 N/m for the as-deposited SiCN film on Si(100). Furthermore, a maximum adhesive strength of 92 N/m was obtained after treating the film for 10 min at 1000• C.

We investigated the wet-etching properties of SiCN films using chemical agents. Our results show that sodium hydroxide, potassium hydroxide and phosphoric acid etch SiCN films, while hydrochloric acid, sulfuric acid, acetic acid, ammonium chloride and sodium chloride cannot etch SiCN films.

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