Thus far, despite the development of electric field sensors (EFSs) such as field mills, optoelectronic EFSs and microelectromechanical system (MEMS)-based EFSs, no sensor can accurately measure an electric field in space due to the existence of space charge and the influence of charge attachment. To measure a spatial synthetic electric field in an ion flow field, a double potential independent differential EFS based on MEMS is proposed. Compared with other EFSs, this method has the advantages of independent potential (without grounding) and the ability to support the measurement of the synthetic ion flow electric field in space. First, to analyse the charge distribution after the sensor is involved exposed to an electric field, a simulation model was constructed. Then, given the redistribution of the spatial electric field in space and the influence of the surface charge on the sensor, the quantitative relationship between the electric field to be measured and that measured by the proposed sensor was obtained. To improve the performance of the EFS, a set of synthetic field strength sensor calibration systems that consider spatial ion flow injection was established. Furthermore, the parameter λ, which is related to the relative position of the differential chips, was determined. Finally, a series of comparative experiments indicated that the differential EFS highlighted in the present study exhibits good linearity and accuracy.

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