The world‐wide spreading of coronavirus disease (COVID‐19) has greatly shaken human society, thus effective and fast‐speed methods of non‐daily‐life‐disturbance sterilization have become extremely significant. In this work, by fully benefitting from high‐quality AlN template (with threading dislocation density as low as ≈6×10 8 cm −2 ) as well as outstanding deep ultraviolet (UVC‐less than 280 nm) light‐emitting diodes (LEDs) structure design and epitaxy optimization, high power UVC LEDs and ultra‐high‐power sterilization irradiation source are achieved. Moreover, for the first time, a result in which a fast and complete elimination of SARS‐CoV‐2 (the virus causes COVID‐19) within only 1 s is achieved by the nearly whole industry‐chain‐covered product. These results advance the promising potential in UVC‐LED disinfection particularly in the shadow of COVID‐19.

In order to improve the spinning efficiency, the spinning experiments with cellulose/1-butyl-3-methylimidazolium chloride solution were done whilst increasing spinning speed. It was found that the tenacity and initial modulus of regenerated cellulose fibers increased but the elongation at break decreased slightly with increasing spinning speed at constant draw ratio. Further, the synchrotron wideangle X-ray diffraction and small-angle X-ray scattering were carried out to illustrate the relationship between the structure and the mechanical properties. It was shown that the crystal orientation, crystallinity, amorphous orientation factor as well as orientation of the microvoids along the fiber increased with the spinning speed as the diameter of the microvoids in the fiber decreased. From the analysis of the spinline stress, it is clear that the spinline stress increased when both extruding and draw speed increased at constant draw ratio. This resulted in the improvement of supramolecular structure and mechanical properties of the regenerated cellulose fibers.

Ultraviolet-C light-emitting diodes (UVC-LEDs) have great application in pathogen inactivation under various kinds of situations, especially in the fight against COVID-19. Unfortunately, its epitaxial wafers are so far limited to a size of 2 inches, which greatly increases the cost of massive production. In this work, a 4-inch crack-free high-power UVC-LED wafer is reported. This achievement relies on a proposed strain-tailored strategy, where a 3D to 2D (3D-2D) transition layer is introduced during the homo-epitaxy of AlN on the high temperature annealed (HTA)-AlN template, which successfully drives the original compressive strain into a tensile one and thus solves the challenge of realizing a high-quality Al 0.6 Ga 0.4 N layer with a flat surface. This smooth Al 0.6 Ga 0.4 N layer is nearly pseudomorphically grown on the strain-tailored HTA-AlN template, leading to 4-inch UVC-LED wafers with outstanding performances. The strategy succeeds in compromising the bottlenecked contradictory in producing a large-sized UVC-LED wafer on pronounced crystalline AlN template: The compressive strain in HTA-AlN allows for a crack-free 4-inch wafer, but at the same time leads to a deterioration of the AlGaN morphology and crystal quality. The launch of 4-inch wafers makes the chip fabrication process of UVC-LEDs match the mature blue one, and will definitely speed up the universal application of UVC-LED in daily life.

Quasi van der Waals epitaxy, a pioneering epitaxy of sp3‐hybridized semiconductor films on sp2‐hybridized 2D materials, provides a way, in principle, to achieve single‐crystal epilayers with preferred atom configurations that are free of substrate. Unfortunately, this has not been experimentally confirmed in the case of the hexagonal semiconductor III‐nitride epilayer until now. Here, it is reported that the epitaxy of gallium nitride (GaN) on graphene can tune the atom arrangement (lattice polarity) through manipulation of the interface atomic configuration, where GaN films with gallium and nitrogen polarity are achieved by forming CONGa(3) or COGaN(3) configurations, respectively, on artificial CO surface dangling bonds by atomic oxygen pre‐irradiation on trilayer graphene. Furthermore, an aluminum nitride buffer/interlayer leads to unique metal polarity due to the formation of an AlON thin layer in a growth environment containing trace amounts of oxygen, which explains the open question of why those reported wurtzite III‐nitride films on 2D materials always exhibit metal polarity. The reported atomic modulation through interface manipulation provides an effective model for hexagonal nitride semiconductor layers grown on graphene, which definitely promotes the development of novel semiconductor devices.

Transferred graphene provides a promising III-nitride semiconductor epitaxial platform for fabricating multifunctional devices beyond the limitation of conventional substrates. Despite its tremendous fundamental and technological importance, it remains an open question on which kind of epitaxy is preferred for single-crystal III-nitrides. Popular answers to this include the remote epitaxy where the III-nitride/graphene interface is coupled by nonchemical bonds, and the quasi-van der Waals epitaxy (quasi-vdWe) where the interface is mainly coupled by covalent bonds. Here, we show the preferred one on wet-transferred graphene is quasi-vdWe. Using aluminum nitride (AlN), a strong polar III-nitride, as an example, we demonstrate that the remote interaction from the graphene/AlN template can inhibit out-of-plane lattice inversion other than in-plane lattice twist of the nuclei, resulting in a polycrystalline AlN film. In contrast, quasi-vdWe always leads to single-crystal film. By answering this long-standing controversy, this work could facilitate the development of III-nitride semiconductor devices on two-dimensional materials such as graphene.