One of the present intensive concerns about the high-temperature superconductors is whether charge stripes are a key to superconductivity. Here we report observation of charge stripes in the simplest copper oxide, CuO, by real-space images obtained by electron microscopy. Charge-ordered domains and normal-lattice domains exist alternatively in the vapor-grown single crystal of CuO. Since CuO consists of the Cu-O bonding, which is a basic material feature for high- T(c) cuprates, the discovery of charge stripes in this basic compound has important implications for discussing the mechanism of superconductivity in complex cuprates.

Ferromagnetic epitaxial B2-type Fe3Si∕FeSi2 superlattices were prepared on Si(111) at room temperature by facing target direct-current sputtering. The bilinear and biquadratic coupling constants J1 and J2 of the antiferromagnetically coupled superlattice were comparable to those of the similar superlattices using Fe layers although the saturation magnetization of Fe3Si is approximately half as large as that of Fe. The authors believe that this is due to the formation of a well-ordered quantum well in the spacers, which is mainly caused by the regular accumulation of highly oriented Fe3Si layers.

Ferromagnetic Fe3Si thin films with an extremely smooth surface morphology can be epitaxially grown on Si(111) at room temperature by facing target direct-current sputtering. The epitaxial relationship is Fe3Si(111)‖Si(111) with Fe3Si[11¯0]‖Si[1¯10]. By the application of the extinction rule of x-ray diffraction, the generated Fe3Si was confirmed to possess a B2 structure and not a DO3 one. The film showed a saturation magnetization value of 960emu∕cm3, which was slightly lower than that of bulk DO3-Fe3Si. It was observed that the magnetization easy axis was along the [11¯0] direction in the film plane.

Amorphous iron silicide was reported to be semiconducting as well as β-FeSi2, and it has received considerable attention from both the physical and engineering points of view. However, there have been few studies and its basic properties are still unknown. We could grow the semiconducting nanocrystalline iron disilicide thin films by pulsed-laser deposition using an FeSi2 target. They consist of crystallites with diameters ranging from 3 to 5 nm. The carrier density and the mobility at 300 K were 1.5×1019 cm−3 and 35 cm/V s, respectively.

Fe3Si/FeSi2 superlattices were prepared on Si(111) at two deposition rates by facing target direct-current sputtering. For the deposition rates of 2.0 nm/min for Fe3Si and 1.3 nm/min for FeSi2, the Fe3Si layers were nonoriented. On the other hand, for half-deposition rates, the Fe3Si layers were epitaxially grown not only on Si(111) but also up to the top layer across the FeSi2 layers. The antiferromagnetic interlayer coupling between the Fe3Si layers was induced in the epitaxial superlattices, whereas it disappeared in the nonepitaxial superlattices. The regular accumulation of highly oriented Fe3Si layers is crucial for the interlayer coupling induction.