Silicon oxynitride (SiON) was deposited as a core layer on a silica (SiO 2 ) under-cladding layer by using plasma enhanced chemical vapor deposition (PECVD). The refractive index of the SiON core layer was varied between 1.45 and 1.78 by changing the gas flow ratio of SiH 4 , N 2 O and NH 3 . Etching experiments were performed using a dry etching equipment to fabricate the SiON core. An optical planar waveguide with a core and under-cladding thicknesses of 6 μm and 8 μm, respectively, and a refractive index contrast (∆n) of 7 % has been fabricated.

Porous Ti implant samples were fabricated by the sintering of spherical Ti powders in a high vacuum furnace. To increase their surface area and biocompatibility, anodic oxidation and a hydrothermal treatment were then applied. Electrolytes in a mixture of glycerophosphate and calcium acetate were used for the anodizing treatment. The resulting oxide layer was found to have precipitated in the phase form of anatase TiO 2 and nano-scaled hydroxyapatite on the porous Ti implant surface. The porous Ti implant can be modified via an anodic oxidation method and a hydrothermal treatment for the enhancement of the bioactivity, and current multi-surface treatments can be applied for use in a dental implant system. Key words Ti implant, porous, hydroxyapatite, bioactive, surface treatment. 실험 방법실험에 사용할 시편은 200~250 µm 크기의 Ti 분말