Infrared absorption spectroscopy of vibro-rotational molecular resonances provides a powerful method for investigation of a wide range of molecules and molecular compounds. However, the wavelength of light required to excite these resonances is often orders of magnitude larger than the absorption cross sections of the molecules under investigation. This mismatch makes infrared detection and identification of nanoscale volumes of material challenging. Here we demonstrate a new type of infrared plasmonic antenna for long-wavelength nanoscale enhanced sensing. The plasmonic materials utilized are epitaxially grown semiconductor engineered metals, which results in high-quality, low-loss infrared plasmonic metals with tunable optical properties. Nanoantennas are fabricated using nanosphere lithography, allowing for cost-effective and large-area fabrication of nanoscale structures. Antenna arrays are optically characterized as a function of both the antenna geometry and the optical properties of the plasmonic semiconductor metals. Thin, weakly absorbing polymer layers are deposited upon the antenna arrays, and we are able to observe very weak molecular absorption signatures when these signatures are in spectral proximity to the antenna resonance. Experimental results are supported with finite element modeling with strong agreement.
One-dimensional crystal growth allows the epitaxial integration of compound semiconductors on silicon (Si), as the large lattice-mismatch strain arising from heterointerfaces can be laterally relieved. Here, we report the direct heteroepitaxial growth of a mixed anion ternary InAsyP1-y nanowire array across an entire 2 in. Si wafer with unprecedented spatial, structural, and special uniformity across the entire 2 in. wafer and dramatic improvements in aspect ratio (>100) and area density (>5 × 10(8)/cm(2)). Heterojunction solar cells consisting of n-type InAsyP1-y (y = 0.75) and p-type Si achieve a conversion efficiency of 3.6% under air mass 1.5 illumination. This work demonstrates the potential for large-scale production of these nanowires for heterogeneous integration of optoelectronic devices.
Producing densely packed high aspect ratio InGaAs nanostructures without surface damage is critical for beyond Si-CMOS nanoelectronic and optoelectronic devices. However, conventional dry etching methods are known to produce irreversible damage to III-V compound semiconductors because of the inherent high-energy ion-driven process. In this work, we demonstrate the realization of ordered, uniform, array-based InGaAs pillars with diameters as small as 200 nm using the damage-free metal-assisted chemical etching (MacEtch) technology combined with the post-MacEtch digital etching smoothing. The etching mechanism of InGaAs is explored through the characterization of pillar morphology and porosity as a function of etching condition and indium composition. The etching behavior of InGaAs, in contrast to higher bandgap semiconductors (e.g., Si or GaAs), can be interpreted by a Schottky barrier height model that dictates the etching mechanism constantly in the mass transport limited regime because of the low barrier height. A broader impact of this work relates to the complete elimination of surface roughness or porosity related defects, which can be prevalent byproducts of MacEtch, by post-MacEtch digital etching. Side-by-side comparison of the midgap interface state density and flat-band capacitance hysteresis of both the unprocessed planar and MacEtched pillar InGaAs metal-oxide-semiconductor capacitors further confirms that the surface of the resultant pillars is as smooth and defect-free as before etching. MacEtch combined with digital etching offers a simple, room-temperature, and low-cost method for the formation of high-quality InGaAs nanostructures that will potentially enable large-volume production of InGaAs-based devices including three-dimensional transistors and high-efficiency infrared photodetectors.
Cellular microstructures form naturally in many living organisms (e.g., flowers and leaves) to provide vital functions in synthesis, transport of nutrients, and regulation of growth. Although heterogeneous cellular microstructures are believed to play pivotal roles in their three-dimensional (3D) shape formation, programming 3D curved mesosurfaces with cellular designs remains elusive in man-made systems. We report a rational microlattice design that allows transformation of 2D films into programmable 3D curved mesosurfaces through mechanically guided assembly. Analytical modeling and a machine learning–based computational approach serve as the basis for shape programming and determine the heterogeneous 2D microlattice patterns required for target 3D curved surfaces. About 30 geometries are presented, including both regular and biological mesosurfaces. Demonstrations include a conformable cardiac electronic device, a stingray-like dual mode actuator, and a 3D electronic cell scaffold.
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