According to the transmission mode of polarized light in Mueller ellipsometry, a characterization method for the thickness and optical constants of isotropic nano films based on Self-Adaptive Differential Evolution algorithm (SADE) is proposed. By establishing the least square model of the output light intensity with respect to the Mueller matrix of the standard sample to be measured, the elements of the Mueller matrix are solved by using the Sade algorithm, and the Mueller spectral curve obtained by fitting is compared with that measured by DRC-MME, and the film thickness is calculated by using the transfer matrix. The SiO2 / Si standard samples with calibration values of 100.4 nm and 121.56 nm are simulated and calculated. The experiment shows that: when numbers of iterations accumulated to 65 and 80 respectively, the residual square sum of the light intensity of the objective function converges to the minimum values of 1.24 and 1.02. The calculated film thickness values are 101.25nm and 120.53nm respectively, and the relative errors are both less than 1%. It proves the characteristics of simple calculation, fast convergence and accurate global optimal solution.
A phase correction method based on multi frequency heterodyne principle is proposed for the phase jump error caused by multi frequency heterodyne phase solution. The traditional phase shifting method and multi frequency heterodyne are used to calculate the wrapping phase and the unwrapping phase. Aiming at the jump error in the unwrapping phase, the unwrapping phase is used to locate the error position. The wrapping phase is used as a reference to correct the position of the positioning error to obtain a new unwrapping phase. The experimental results show that under the optimization method, this method can effectively judge the jump, and obtain the unwrapping phase without jump error after eliminating the jump, which greatly improves the unwrapping accuracy and accuracy of the fringe pattern after phase unwrapping.
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