The formation of tapered self-catalyzed nanowires grown on reflecting substrates is studied theoretically. Within the model the nanowire radius is obtained as a function of length. The model describes the morphology of tapered nanowires. We study the influence of different growth parameters on the nanowire morphology, including the III/V flux ratio and pitch.
A model is developed for the initial stage of nucleation of III-V nanowires including nitrides (III-V NWs) and other nanostructures grown by selective area epitaxy on masked substrates with regular arrays of pinholes. A criterion for the growth selectivity is obtained, which ensures nucleation of III-V NWs within the pinholes but not on a mask surface. The temperature, group III and V fluxes, pinhole radius and pitch dependences of the selective growth zones are analyzed