Национальный исследовательский технологический университет «МИСиС», г. Москва Ф. В. Кирюханцев-Корнеев -ст. науч. сотрудник Научно-учебного центра СВС, доцент кафедры порошковой металлургии и функциональных покрытий МИСиС (119049, г. Москва, В-49, Ленинский пр-т, 4). Тел.: (495) 638-46-59. E-mail: kiruhancev-korneev@yandex.ru.Проанализировано современное состояние исследований функциональных поверхностей и покрытий с помощью метода оптической эмис-сионной спектроскопии тлеющего разряда (GDOES). Описаны его основные принципы. С целью определения требований к образцам и вы-явления потенциальных возможностей метода проведены GDOES-исследования покрытий с различными составами и структурными харак-теристиками, полученных с использованием нескольких способов. Ключевые слова: оптическая эмиссионная спектроскопия тлеющего разряда, GDOES, функциональные поверхности, покрытия, пленки, хи-мический анализ, элементный профиль.The current state of functional surface and coating studies by glow discharge optical emission spectrometry (GDOES) has been analyzed. The main principles are described. For the purpose of determination of the requirements to samples and detection of potential possibilities of the technique, the GDOES-investigations of different composition coatings and structural characteristics, which are obtained by some procedures, have been carried out.

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The main trends of modern developing magnetic microelectronics are miniaturization and speed, while ensuring efficient operation in the MHz and GHz frequency ranges of magnetic fields. Developing new magnetic materials featured by properties that ensure the implementation of these trends is the key fundamental and applied problem of materials science. In this regard, Fe-Me-X nanocrystalline soft magnetic alloys (Me is one of the metals from Group IVb of the Periodic Table, X is one of the N, C, O, B light elements) obtained in the form of films are of interest. As shown earlier by the authors of this article on Fe-Zr-N films, such films featuring by the Fe/MeX two-phase structure can provide a combination of high saturation induction (Bs), low coercive force (Hc), high hardness, and thermal stability of the structure. The films were produced by magnetron sputtering. The data obtained and published by the authors on the Fe–Ti–B films earlier indicate great prospects for their application in modern microelectronics. There are no any other published results of FeTiB film studies in the context of microelectronics applications. In this paper, we continue the studies of FeTiB films started earlier to identify the chemical and phase composition providing the level of properties required for film application in microelectronics. Nanocrystalline films containing 0 to 14.3 at.% Ti and 0 to 28.9 at.% B were obtained by DC magnetron sputtering. The phase-structural state of the films was studied by X-ray diffraction and transmission electron microscopy. All films are divided into 3 groups according to phase composition: single-phase (supersaturated solid solution of Ti in α-Fe), two-phase (α-Fe(Ti)/α-Ti, α-Fe(Ti)/TiB2, α-Fe (Ti)/FeTi, α-Fe(Ti)/Fe2B) and XRD amorphous. It is shown that XRD amorphous films feature by a mixed structure represented by a solid solution of α-Fe(Ti) with a grain size between 0.7 and 2 nm and an amorphous phase. A reasonable assumption is made on the amorphous phase enrichment by boron. A quantitative assessment of the α-Fe(Ti) phase grain size and its dependence on the chemical and phase composition of the films is given. The mechanisms of solid solution and dispersion hardening determine the grain size of this phase.

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