15days electron beam exposure for manufacturing of large area silicon based NIL master

Thrun, Xaver; Choi, Kang‐Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Paul, J.; Rudolph, Matthias; Steidel, Katja

doi:10.1016/j.mee.2013.02.082

Cited by 3 publications

(3 citation statements)

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“…In case of small (and potentially repetitive) complex exposure geometries, also the approximation of the desired shapes by the rectangular or triangular imposes a substantial amount of exposure shots and consequently, a long exposure time, which can be of unrealistic extent. Aside of the related cost of such an exposure also the stability of the overall process becomes a challenge [12]. The way towards an even higher throughput in such a situation is the use of the CP writing mode, in which a complex exposure geometry is hard coded in a so-called mini reticle.…”

Section: Efficient E-beam Lithography For Nano-optical Structuresmentioning

confidence: 99%

The potential of e-beam lithography for micro- and nano-optics on large areas

Zeitner

Banasch

Trost

2023

Novel Patterning Technologies 2023

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The availability of high-resolution and high throughput lithographic fabrication technologies such as electron-beam lithography based on Variable Shaped Beam writing and Character Projection opens the way for the flexible use of various optical nano-structures for some of the most demanding applications. The paper discusses the technical features, advantages, and limitations of these pattering approaches and will show how they can favorably be combined to realize optical nano-structures for applications, which are as diverse as gratings for ultra-short laser pulses or high resolution spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses, gratings), or UV-polarizers.

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Section: Efficient E-beam Lithography For Nano-optical Structuresmentioning

confidence: 99%

The potential of e-beam lithography for micro- and nano-optics on large areas

Zeitner

Banasch

Trost

2023

Novel Patterning Technologies 2023

View full text Add to dashboard Cite

show abstract

“…In the case of small (and potentially repetitive) complex exposure geometries, the approximation of the desired shapes by the rectangular or triangular imposes a substantial amount of exposure shots and, consequently, a long exposure time, which can be of unrealistic extent. In addition to the related cost of such an exposure, the stability of the overall process becomes a challenge 12 . The way toward an even higher throughput in such a situation is the use of the CP writing mode, in which a complex exposure geometry is hard coded in a so-called mini-reticle.…”

Section: Efficient E-beam Lithography For Nano-optical Structuresmentioning

confidence: 99%

“…In addition to the related cost of such an exposure, the stability of the overall process becomes a challenge. 12 The way toward an even higher throughput in such a situation is the use of the CP writing mode, in which a complex exposure geometry is hard coded in a so-called mini-reticle. In the case of the SB350 OS e-beam writer, a complex pattern with a maximum 2 μm × 2 μm size can be exposed with a single-electron beam shot.…”

Section: Introductionmentioning

confidence: 99%

Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

Zeitner

Banasch

Trost

2023

J. Micro/Nanopattern. Mats. Metro.

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.The availability of high-resolution and high-throughput lithographic fabrication technologies, such as electron-beam lithography, based on variable shaped beam writing and character projection opens the way for the flexible use of various optical nano-structures for some of the most demanding applications. We discuss the technical features, advantages, and limitations of these pattering approaches and show how they can favorably be combined to realize optical nano-structures for applications, which are as diverse as gratings for ultra-short laser pulses or high-resolution spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses and gratings), or UV-polarizers.

show abstract