2021 IEEE International Electron Devices Meeting (IEDM) 2021
DOI: 10.1109/iedm19574.2021.9720542
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18nm FDSOI Technology Platform embedding PCM & Innovative Continuous-Active Construct Enhancing Performance for Leading-Edge MCU Applications

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Cited by 14 publications
(1 citation statement)
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“…The first requirement was achieved in PCM by material engineering, thanks to the introduction of Ge-rich GeSbTe (GGST) chalcogenide alloys, which provide great retention capability of more than 10 years at 185 • C [1]. Thanks to this breakthrough, PCM became a suitable candidate, introduced in advanced CMOS technology nodes such as 28 nm and even 18 nm [2]. The programming current reduction to target portable and low power applications remains an important goal to reach and the main development axes are scaling [3,4], material engineering [5], and thermal optimization [6].…”
Section: Introductionmentioning
confidence: 99%
“…The first requirement was achieved in PCM by material engineering, thanks to the introduction of Ge-rich GeSbTe (GGST) chalcogenide alloys, which provide great retention capability of more than 10 years at 185 • C [1]. Thanks to this breakthrough, PCM became a suitable candidate, introduced in advanced CMOS technology nodes such as 28 nm and even 18 nm [2]. The programming current reduction to target portable and low power applications remains an important goal to reach and the main development axes are scaling [3,4], material engineering [5], and thermal optimization [6].…”
Section: Introductionmentioning
confidence: 99%