2002
DOI: 10.1889/1.1830926
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27.3: New In‐Line Machine Concept for OLED Manufacturing

Abstract: A profitable mass production of Organic Light Emitting Diode (OLED) displays needs a new type of manufacturing equipment. We present the concept of a vertical In-Line machine equipped with linear etch and linear evaporation sources for organic materials(small molecules) and sputter as well as evaporation sources for metals and ITO.

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Cited by 14 publications
(9 citation statements)
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“…Together with Applied Materials (former Applied Films) at the Fraunhofer IPMS the first vertical In-Line machine for OLED manufacturing was established, named VES 400 [1]. The VES 400 is designed for a substrate height of 400 mm and a substrate width of 470 mm or even larger.…”
Section: Vertical In-line System For Lighting Applicationsmentioning
confidence: 99%
“…Together with Applied Materials (former Applied Films) at the Fraunhofer IPMS the first vertical In-Line machine for OLED manufacturing was established, named VES 400 [1]. The VES 400 is designed for a substrate height of 400 mm and a substrate width of 470 mm or even larger.…”
Section: Vertical In-line System For Lighting Applicationsmentioning
confidence: 99%
“…Organic light emitting diode (OLED) 1 has fast developed into an important technique of choice for many flat panel display applications. As volume production becomes necessary new manufacturing techniques are being developed with the goal to achieve uniform, high rate coating over large size panels [2][3][4] . Sumitomo Corporation and SVT Associates have jointly developed an evaporation source specifically designed to address the issue of cost effective and high yield OLED production.…”
Section: Objective and Backgroundmentioning
confidence: 99%
“…Most commonly, the thermal evaporation process utilizes the source of a point type in which a fixed crucible supplies the thin film material to the rotating substrate. Needless to say, much research has been already studied on the deposition process using the point source . While the point source has a simple structure and much research data accumulated, it requires a long source‐to‐substrate distance to maintain stable uniformity and this becomes unattractive as the substrate size is increased.…”
Section: Introductionmentioning
confidence: 99%
“…Needless to say, much research has been already studied on the deposition process using the point source. 1,3,4 While the point source has a simple structure and much research data accumulated, it requires a long source-to-substrate distance to maintain stable uniformity and this becomes unattractive as the substrate size is increased. Consequently, the process using the point source has reduced fraction of material that deposits on the substrate and accompanies an expansion of a vacuum chamber, that is a decrease of the process efficiency.…”
Section: Introductionmentioning
confidence: 99%