5.1: Invited Paper: A 5.7″ Color Mirasol® XGA Display For High Performance Applications

Abstract

A 5.7" color reflective display module based on bi-stable Interference Modulation Devices (IMODs) with a projective capacitive touchscreen is described.The operation of the module is outlined and the performance reported. The system level developments necessary to achieve the high reflectivity, color and video operation while maintaining low power consumption are discussed.

High‐performance MEMS shutter display with metal‐oxide thin‐film transistors and optimized MEMS element

“…1 Display technology is one of the main applications of large area electronics and MEMS technology has the promise to enable efficient, responsive, and vibrant image reproduction while reducing power consumption by eliminating lossy elements and increasing robustness. Though several attempts at commercialization had failed before, [2][3][4] our group has successfully demonstrated highly efficient and robust vertically translating MEMS shutter display for transmissive display application. [5][6][7] The vertically translated MEMS shutter display technology has been further improved by integrating metaloxide thin-film transistors (TFTs) and optimizing the structure for a high-resolution and highly efficient display.…”

50.2: Invited Paper: Characterization of Co‐Fabricated Silicon TFT and MEMS Shutter Display

“…Micro-electro-mechanical-systems (MEMS) can be used for implementing fast switching light shutters with outstanding high contrast ratios and optical throughput efficiencies. In the past, various reflective 1 and transmissive displays 2,3 have been reported that were built using conventional active matrix display technologies. In the past years, the Institute for Large Area Microelectronics (IGM) of the University of Stuttgart, Germany, has been demonstrating active matrix addressed arrays of vertically translating MEMS shutters, whose thin film transistors (TFTs) and vertically translating pre-stressed MEMS shutters were co-produced in a modified top-gate amorphous silicon process 4 using only four 5,6 or five 7 lithography masks.…”

39‐4: TFT Integrated Microelectromechanical Shutter for Display Application

“…Display manufacturing technology emphasizes the reduction of lithographic mask counts and the applicability of processes for large area manufacturing. Several attempts have been made to produce reflective [1] and transmissive displays [2], [3] utilizing standard display manufacturing technology, but failed to commercialize the products. More recently, our group demonstrated a top gate a-Si:H TFT integrated MEMS process which requires only four masks and has the same complexity of conventional AMLCD or AMOLED backplane processes [4].…”