2014
DOI: 10.1109/tcsi.2014.2336531
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A 40 nm 512 kb Cross-Point 8 T Pipeline SRAM With Binary Word-Line Boosting Control, Ripple Bit-Line and Adaptive Data-Aware Write-Assist

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Cited by 33 publications
(15 citation statements)
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“…As it provides a large signal VTC, it would allow fast switching with large voltage gain. In proposed cells, the PUNs represent the load transistors built with pseudo-nMOS inverter as showjn in Figure 1 To keep the cell area within the reasonable value, the width of the cell ratio is kept in the range given by (1). The stability of the write SNM depends on the pull-up ratio.…”
Section: Read Access Time (Tra) and Stabilitymentioning
confidence: 99%
See 2 more Smart Citations
“…As it provides a large signal VTC, it would allow fast switching with large voltage gain. In proposed cells, the PUNs represent the load transistors built with pseudo-nMOS inverter as showjn in Figure 1 To keep the cell area within the reasonable value, the width of the cell ratio is kept in the range given by (1). The stability of the write SNM depends on the pull-up ratio.…”
Section: Read Access Time (Tra) and Stabilitymentioning
confidence: 99%
“…SRAM technology is more suitable for high-speed and low-power applications like processors, computing units and other sophisticated devices, scientific and industrial subsystems, modern appliances, automotive electronics, mobile phones etc [1], [2]. Low-Power, Low-Voltage stability with high packaging density has represented the fundamental topics of the recent decade regarding SRAM outlines [3].…”
Section: Introductionmentioning
confidence: 99%
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“…However, all functions of an SRAM such as read, write and hold margins will be affected by increased process variation at low supply voltages (e.g., near or sub-threshold regions) which has degraded the yield. To improve the performance of the SRAM cell at ultra-low supply voltages, several FinFET SRAM solutions from device level [13] to circuit [17][18][19] and architecture level [20][21][22][23][24] have been proposed. However, most of these architectures suffer from degraded access time, especially at near/sub-threshold regions.…”
Section: Finfet-based Srammentioning
confidence: 99%
“…Besides, in 6 T‐SRAM cell, the conflict between read and write limits the minimum supply voltage; hence, the window of lowering the supply voltage to achieve lower power consumption is reduced further. To improve the performance of the SRAM cell at ultra‐low supply voltages, several FinFET SRAM solutions from device level to circuit and architecture level have been proposed. In , an asymmetric device FinFET is realized by unequally doped drain and source terminals leading to unequal currents flow for positive and negative Drain‐Source (V DS ) voltages.…”
Section: Introductionmentioning
confidence: 99%