2020
DOI: 10.1109/ted.2019.2950986
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A 4H-SiC UV Phototransistor With Excellent Optical Gain Based on Controlled Potential Barrier

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Cited by 19 publications
(8 citation statements)
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“…An estimation of the generated photocurrent per unit area is used to predict the photocurrent magnitude in the design. For this purpose, a responsivity report on a 2.6 mm 2 SiC UV photodetector in the same Fraunhofer IISB technology 26 – 28 is taken as a reference. The responsivity R ( λ ) is multiplied by the UV light source irradiance P o p t ( λ ) for a set of points followed by the uniform midpoint Riemann sum, resulting in …”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations
“…An estimation of the generated photocurrent per unit area is used to predict the photocurrent magnitude in the design. For this purpose, a responsivity report on a 2.6 mm 2 SiC UV photodetector in the same Fraunhofer IISB technology 26 – 28 is taken as a reference. The responsivity R ( λ ) is multiplied by the UV light source irradiance P o p t ( λ ) for a set of points followed by the uniform midpoint Riemann sum, resulting in …”
Section: Methodsmentioning
confidence: 99%
“… Spectral information on the a Fraunhofer IISB 2.6 mm 2 SiC UV photodiode 26 – 28 responsivity R ( λ ), b the UV LED irradiance P o p t ( λ ) of four discrete diodes with 5 mW radiant flux each and c the result of that gives the corresponding photocurrent generation. …”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…This state-of-the-art 4H-SiC CMOS [41], [42] was developed by the Fraunhofer Institute for Integrated Systems and Devices Technology (IISB), based in Erlangen, Germany. The group of Mantooth at the University of Arkansas reported high-temperature memory SRAM cells [43] in this technology and Fraunhofer IISB demonstrated compatible UV photodetectors [44], [45] and temperature sensors [46]. This work reports on the state-of-the-art open 6 μm SiC CMOS technology, developed at Fraunhofer IISB, by providing an overview of the technology and results of implemented devices and circuits on a multiproject wafer design (Fig.…”
Section: Integrated Digital and Analog Circuit Blocks In Amentioning
confidence: 99%
“…The advantages of the SiC MSM structure and Schottky barrier photodetector include the simplicity of manufacture [13,14]. However, the photon absorptivity is rather poor due to the semi-transparent electrode's substantial light absorption effect, and the photoconductance gain will have a significant impact on the device's responses time [15,16]. On the contrary, compared with Schottky PDs, fabrication of p-n PDs and p-i-n PDs is relatively more complex, as both n type and p type doping are required in their device structure.…”
Section: Introductionmentioning
confidence: 99%