2008
DOI: 10.1109/led.2008.922142
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A Bulk FinFET Unified-RAM (URAM) Cell for Multifunctioning NVM and Capacitorless 1T-DRAM

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Cited by 27 publications
(12 citation statements)
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“…3(c). Before the cell is allocated to the 1T-DRAM mode, V T is adjusted to 0.2 V by preprogramming of the NVM [1], [2]. As shown in Fig.…”
Section: Device Fabricationmentioning
confidence: 99%
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“…3(c). Before the cell is allocated to the 1T-DRAM mode, V T is adjusted to 0.2 V by preprogramming of the NVM [1], [2]. As shown in Fig.…”
Section: Device Fabricationmentioning
confidence: 99%
“…U NIFIED RAM (URAM) is a promising fusion memory for combining high-speed DRAM and nonvolatile memory (NVM) into a single memory transistor [1], [2]. Unlike the conventional 1T/1C DRAM, the DRAM mode of URAM uses a floating-body hysteresis effect, which enables the capacitorless 1T-DRAM [3].…”
Section: Introductionmentioning
confidence: 99%
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“…Originally, partially depleted silicon-on-insulator (SOI) devices were used to demonstrate the working principle [1]. Later on, more scalable devices were also shown [2]- [4], and in [5] and [6], a 1T-DRAM cell realized on a bulk substrate has also been demonstrated. In particular, bulk FinFET devices are of high interest because they are more scalable than planar bulk devices, have an extra degree of freedom (fin height) for increasing the charge storage area, and can be cointegrated with planar bulk devices and, at the same time, avoid the problem of heat dissipation, which is present in SOI FinFET devices.…”
Section: Introductionmentioning
confidence: 99%
“…A partially-depleted (PD) FinFET was reported to enhance 1T-DRAM performance [1,2]; however it imposes a constraint on further scaling due to the tradeoff relation between the sensing margin and immunity to short-channeleffects (SCEs), as shown in Fig. 1.…”
Section: Introductionmentioning
confidence: 99%