2016
DOI: 10.1038/nnano.2016.108
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A charge-density-wave oscillator based on an integrated tantalum disulfide–boron nitride–graphene device operating at room temperature

Abstract: The charge-density-wave (CDW) phase is a macroscopic quantum state consisting of a periodic modulation of the electronic charge density accompanied by a periodic distortion of the atomic lattice in quasi-1D or layered 2D metallic crystals. Several layered transition metal dichalcogenides, including 1T-TaSe, 1T-TaS and 1T-TiSe exhibit unusually high transition temperatures to different CDW symmetry-reducing phases. These transitions can be affected by the environmental conditions, film thickness and applied ele… Show more

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Cited by 195 publications
(293 citation statements)
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“…Electronic applications such as oscillators [37] and nonvolatile memory storage [38,39] have been demonstrated successfully in recent years, based on the charge density wave phase transitions. Although the investigations of bulk CDW materials have been done extensively for decades, as atomically thin materials, their role is simply up to date.…”
Section: Introductionmentioning
confidence: 99%
“…Electronic applications such as oscillators [37] and nonvolatile memory storage [38,39] have been demonstrated successfully in recent years, based on the charge density wave phase transitions. Although the investigations of bulk CDW materials have been done extensively for decades, as atomically thin materials, their role is simply up to date.…”
Section: Introductionmentioning
confidence: 99%
“…At voltages larger than V H , the I-V curve has a slope larger than below threshold, indicating a resistance switch from a high resistive state to a low resistive state. As the voltage is scanned back from 1 V to 0 V, the current switches out of the low resistive state to the high resistive state at V L = 0.89 V. This switching occurs at the electrically driven phase transition between the NC-CDW and IC-CDW phase in 1T -TaS 2 [9]. Since the switching can take place as long as the temperature is below the NC-IC phase transition at 350 K, this operation is stable at RT.…”
Section: Resultsmentioning
confidence: 99%
“…method [9]. A thin film of 1T -TaS 2 was placed on a Si substrate with a top layer of 300-nm SiO 2 .…”
Section: Resultsmentioning
confidence: 99%
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