1996
DOI: 10.1007/bf00185931
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A comparison of strain relief behaviour of In x Ga1? x As alloy on GaAs (001) and (110) substrates

Abstract: A comparative study on the strain relief behaviour of epitaxially grown InxGal _,,As (where 0.1 < x< 1) alloys on GaAs (00 1) and (1 10) were carried out using transmission electron microscopy (TEM) and high resolution X-ray diffraction (XRD). Three different strain relief mechanisms related to the formation of misfit dislocations (MDs) were observed. The dominant strain relief process can be a single mechanism or a combination of two of the three mechanisms depending on the substrate orientation and the In co… Show more

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Cited by 12 publications
(12 citation statements)
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“…For In x Ga 1– x As shells grown on GaAs NW sidewalls, it has been shown that three-dimensional (3D) quantum dot (QD) formation readily occurs on {112} sidewalls but is suppressed on {110} sidewalls . Furthermore, for InAs growth on planar GaAs(110), two-dimensional (2D) layer growth is believed to always be favored over 3D growth. , We note that InAs QD growth has been observed for both planar surfaces and NW shells on AlAs(110). Interestingly, the growth of (Al,Ga)As shells around GaAs NW cores has been shown to also result in {112} facets forming at the edges of the {110} NW sidewalls .…”
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confidence: 85%
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“…For In x Ga 1– x As shells grown on GaAs NW sidewalls, it has been shown that three-dimensional (3D) quantum dot (QD) formation readily occurs on {112} sidewalls but is suppressed on {110} sidewalls . Furthermore, for InAs growth on planar GaAs(110), two-dimensional (2D) layer growth is believed to always be favored over 3D growth. , We note that InAs QD growth has been observed for both planar surfaces and NW shells on AlAs(110). Interestingly, the growth of (Al,Ga)As shells around GaAs NW cores has been shown to also result in {112} facets forming at the edges of the {110} NW sidewalls .…”
mentioning
confidence: 85%
“…19 Furthermore, for InAs growth on planar GaAs(110), two-dimensional (2D) layer growth is believed to always be favored over 3D growth. 37,38 We note that InAs QD growth has been observed for both planar surfaces 39 and NW shells 16 on AlAs(110). Interestingly, the growth of (Al,Ga)As shells around GaAs NW cores has been shown to also result in {112} facets forming at the edges of the {110} NW sidewalls.…”
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confidence: 94%
“…11,12 While (In,Ga)As favors SK growth for a wide range of compositions and deposition conditions on GaAs(100), on other low-index GaAs surfaces such as (110) and (111), growth occurs via a 2D FM mode and misfit strain relaxes plastically. [13][14][15][16] Due to the low surface energy of GaAs(110), {110} facets are often present in self-assembled GaAs nanostructures such as nanowires and the growth of QDs on these structures is of interest for high brightness single photon sources. 17,18 Here we show that surfactants can provoke morphological phase transitions in strained layers, inducing the formation of 3D islands "on-demand".…”
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confidence: 99%
“…In the case of GaAs NWs grown by the Ga-assisted vapor–liquid–solid (VLS) mode, the sidewall facets are of {11̅0} orientation . This poses challenges for the realization of advanced hierarchical structures, such as QDs embedded within NWs, , because two-dimensional (2D) layer growth is always favored on GaAs{110} surfaces and three-dimensional (3D) islands do not form by the Stranski–Krastanov (SK) mechanism. , The SK growth of InAs 3D islands on these surfaces has been observed after covering the facets with a thin AlAs layer but this is undesirable for most applications. , In contrast, GaAs NWs synthesized by Au-catalyzed growth typically exhibit {112̅} sidewall facets and the SK mechanism does occur on these surfaces, , however, the presence of Au can be undesirable for many applications.…”
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confidence: 99%