A correlation between the microstructure and optical properties of hydrogenated amorphous carbon films prepared by RF magnetron sputtering

Clin, M.; Durand-Drouhin, O.; Zeinert, A.; Picot, J. C.

doi:10.1016/s0925-9635(98)00404-x

Cited by 33 publications

(16 citation statements)

References 8 publications

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“…It was found that increase of the Ar/C 2 H 2 ratio of the films deposited at 870 W induces the shift of C=C band to lower frequencies. This result indicates the increase of the aromatic carbon structures in the films [10,11]. It has been observed that the relative intensity of sp 3 CH 2−3 modes in the films increases with increasing torch power and decreasing acetylene flow.…”

Section: Infrared Spectroscopy Resultsmentioning

confidence: 71%

“…The band at 1590-1600 cm −1 is assigned to the vibrations of C=C bonds. The broad band at around 1120 cm −1 is related to C−O−C stretching vibrations [10,11]. The spectra of a-C:H films shows presence of sp 3 −CH 2 symmetric (2850 cm −1 ) and asymmetric (2920 cm −1 ) stretching modes, and existence of sp 3 −CH 3 asymmetric (2955 cm −1 ) group.…”

Section: Infrared Spectroscopy Resultsmentioning

confidence: 94%

“…It has been obtained that the growth rate of hydrogenated amorphous carbon films (a-C:H) or polycrystalline diamonds produced by arc plasma jet technique can reach up to 100 nm/s [4][5][6][7]. Meanwhile, the growth rates of a-C:H obtained by traditional chemical vapour deposition (CVD) or physical vapour deposition (PVD) techniques are ten or hundred times lower compared to the arc plasma jet [8][9][10][11][12]. The second advantage of this technique is the formation of carbon films at the atmospheric pressure conditions.…”

Section: Introductionmentioning

confidence: 99%

“…Many authors [4][5][6][7][8][9][10][11][12] have demonstrated that the hydrogen concentration and corresponding proportion of the sp 2 and sp 3 carbon sites in the films determines the properties of carbon coatings. Variation of the deposition process parameters allows one to control and produce a-C:H films with desirable properties.…”

Section: Introductionmentioning

confidence: 99%

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Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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The amorphous hydrogenated carbon films (a-C:H) were formed on the stainless steel substrates from an argon-acetylene gas mixture at atmospheric pressure using a direct current plasma torch discharge. The carbon films were deposited using Ar/C2H2 gas volume ratios 100:1, 150:1, and 200:1 and plasma torch power of 600 and 870 W. It has been obtained that the increase of the torch power leads to higher film growth rate and increases surface roughness. The growth rate varies from 20 up to 425 nm/s depending on the coating formation conditions. The structure and dominant bonds of the films were investigated by Fourier transform infrared (FTIR) and Raman spectroscopy (RS) measurements. RS results indicated that the sp 2 /sp 3 content in the films depended on the torch power and C2H2 amount in argon plasma. It was demonstrated that a diamond-like / graphite-like carbon and glassy carbon films could be deposited by varying the Ar/C2H2 ratio and plasma torch power.

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Section: Infrared Spectroscopy Resultsmentioning

confidence: 71%

Section: Infrared Spectroscopy Resultsmentioning

confidence: 94%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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show abstract

“…In this study, three amorphous carbon (a-C) films were prepared by magnetron sputtering 2,7,9,10,[16][17][18] and the visible Raman spectra of each film was measured three times (n ¼ 3), under constant conditions. This study used XPS and Auger electron spectroscopy [18][19][20] (AES) to confirm the qualities of the three films.…”

Section: Introductionmentioning

confidence: 99%

Comparative Analysis of Trends Resulting from the Use of a Multi-Gaussian Curve Fitting Method Applied to the Visible Raman Spectra of Sputtered Amorphous Carbon

Shen

Chou

2011

Mater. Trans.

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This paper discusses the application of a direct integral area method and a multi-Gaussian curve fitting method to the interpretation of visible Raman spectra. A data analysis study was performed on three amorphous carbon films prepared by magnetron sputtering. Application of XPS, AES and the direct integration of the areas under the curves generated by visible Raman spectra, gave results that represented the diamondlike qualities of three amorphous carbon films in a similar manner, but the representation of data-trends using the multi-Gaussian curve fitting method was irregular. More specifically, we discovered that both the number of Gaussian curves applied, and the analytic regions chosen for analyzing the spectra affected the interpretation of the data obtained; our results indicate that the multi-Gaussian curve fitting method may give rise to inconsistent results when applied to the analysis of the visible Raman spectra of diamond-like (amorphous) carbon films.

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Surface Passivation of Silicon Nanoparticles Monitored by In Situ FTIR

Dworschak,

Müller,

Tjardts

et al. 2024

Plasma Processes & Polymers

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A setup consisting of two atmospheric plasma sources is used for the combined synthesis and passivation of nanoparticles. The silicon nanoparticles synthesized in the first source are analyzed for their chemical composition, morphology, and photoluminescence. The particles are then treated with a second plasma to induce surface passivation. The passivation process of the particles is monitored in real time using in situ infrared absorption spectroscopy. The results indicate that this treatment induces methylation of the silicon nanocrystals, which is further supported by XPS analysis. This surface passivation shifts the maximum of the photoluminescent signal to blue in the visible spectral region. Further optimization of the reported nanoparticle passivation process can provide a flexible tool for tuning nanoparticle properties.

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A correlation between the microstructure and optical properties of hydrogenated amorphous carbon films prepared by RF magnetron sputtering

Cited by 33 publications

References 8 publications

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Comparative Analysis of Trends Resulting from the Use of a Multi-Gaussian Curve Fitting Method Applied to the Visible Raman Spectra of Sputtered Amorphous Carbon

Surface Passivation of Silicon Nanoparticles Monitored by In Situ FTIR

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A correlation between the microstructure and optical properties of hydrogenated amorphous carbon films prepared by RF magnetron sputtering

Cited by 33 publications

References 8 publications

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Comparative Analysis of Trends Resulting from the Use of a Multi-Gaussian Curve Fitting Method Applied to the Visible Raman Spectra of Sputtered Amorphous Carbon

Surface Passivation of Silicon Nanoparticles Monitored by In Situ FTIR

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Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films