2012
DOI: 10.1107/s0909049512036783
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A hard X-ray nanoprobe beamline for nanoscale microscopy

Abstract: The Hard X-ray Nanoprobe Beamline (or Nanoprobe Beamline) is an X-ray microscopy facility incorporating diffraction, fluorescence and full-field imaging capabilities designed and operated by the Center for Nanoscale Materials and the Advanced Photon Source at Sector 26 of the Advanced Photon Source at Argonne National Laboratory. This facility was constructed to probe the nanoscale structure of biological, environmental and material sciences samples. The beamline provides intense focused X-rays to the Hard X-r… Show more

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Cited by 172 publications
(120 citation statements)
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“…Data collection: The coherent diffraction measurements were done at the Hard X-ray Nanoprobe beamline [39][40][41]. A Fresnel zone plate was used to focus 9 keV energy x-rays with wavelength λ = 0.137 nm to a ∼40 nm diameter focal spot (FWHM intensity of the central focus peak).…”
Section: Methodsmentioning
confidence: 99%
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“…Data collection: The coherent diffraction measurements were done at the Hard X-ray Nanoprobe beamline [39][40][41]. A Fresnel zone plate was used to focus 9 keV energy x-rays with wavelength λ = 0.137 nm to a ∼40 nm diameter focal spot (FWHM intensity of the central focus peak).…”
Section: Methodsmentioning
confidence: 99%
“…The geometry and mechanical boundary conditions of these epitaxial device components are such that strain gradients are expected to build up near the vertical interface between the eSiGe and SOI channel regions. The device SOI/eSiGE architecture shown in Figure 3(a) repeats for > 100 periods in the x direction, and is invariant and self-similar in the y direction for tens of microns.Data collection: The coherent diffraction measurements were done at the Hard X-ray Nanoprobe beamline [39][40][41]. A Fresnel zone plate was used to focus 9 keV energy x-rays with wavelength λ = 0.137 nm to a ∼40 nm diameter focal spot (FWHM intensity of the central focus peak).…”
mentioning
confidence: 99%
“…We are convinced that this resolution performance can be extrapolated to the HXR region, as the autocorrelation analysis of the HXR range diffraction experiment supports sub-30 nm fullpitch resolution of the optic. The results show that ML-FZPs are up-and-coming for focusing of hard X-rays to nano-sized focal spots required for direct imaging [1,23,57,58], spectroscopy and for nano-diffraction [33][34][35]59,60] by using ML-FZPs. When compared with the conventional FZP manufacturing technique, namely the EBL, ML-FZPs present a number of interesting characteristics.…”
Section: Resultsmentioning
confidence: 99%
“…high DE, required for HXR. This would be extremely beneficial for materials analysis via HXR nanoprobe beamlines, for instance, in micro-nano-diffraction studies [33,34] to determine the crystal structure with high locality, in addition to high resolution imaging and chemical analysis via spectroscopic techniques, as multi-modal X-ray imaging is getting more and more important [35].…”
Section: Introductionmentioning
confidence: 99%
“…In this work, both average and spatially resolved synchrotron x-ray measurements were made using the Hard X-ray Nanoprobe beamline [15,16] after annealing the film in the stripe phase [17]. During the measurements, the sample was held under vacuum in the Nanoprobe chamber (1.8 × 10 −5 Torr) and oriented such that the substrate miscut azimuth was normal to the scattering plane.…”
Section: Imaging Local Polarization In Ferroelectric Thin Films By Comentioning
confidence: 99%