2023
DOI: 10.1080/00207217.2023.2238326
|View full text |Cite
|
Sign up to set email alerts
|

A low-power SRAM design with enhanced stability and I ON /I OFF ratio in FinFET technology for wearable device applications

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 7 publications
(1 citation statement)
references
References 38 publications
0
1
0
Order By: Relevance
“…The FinFET technology offers better gate control and higher 'on' current compared to CMOS devices. Moreover, better electrostatic control in multi-gate FinFET devices has more impact on digital circuitry, such as SRAM structures [8]. However, the current FinFET research indicates that the subthreshold slope (SS) shows a rising stretch with scaling, despite ITRS Roadmap predictions [9].…”
Section: Introductionmentioning
confidence: 99%
“…The FinFET technology offers better gate control and higher 'on' current compared to CMOS devices. Moreover, better electrostatic control in multi-gate FinFET devices has more impact on digital circuitry, such as SRAM structures [8]. However, the current FinFET research indicates that the subthreshold slope (SS) shows a rising stretch with scaling, despite ITRS Roadmap predictions [9].…”
Section: Introductionmentioning
confidence: 99%