A new approach on advanced compact plasma sensors for industrial plasma applications

Schulz, Christian; Rolfes, Ilona

doi:10.1109/sas.2014.6798958

Cited by 7 publications

(11 citation statements)

References 14 publications

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“…Inserted into a dielectric tube, the ideal assembly of the MRP, the so-called iMRP, mainly consists of two symmetrically powered metallic hemispheres as we have presented in [22]. The extension onto a multilayer printed circuit board (PCB), serving as a holder and feeding device for the hemispheres, leads to the well-known MRP.…”

Section: Multipole Resonance Probementioning

confidence: 99%

“…Here, a corresponding adaption of the mathematical model has to be considered. The principal functionality was presented in [22] emerging the necessity of an accurate positioning of the probe inside the flange. Therefore, an enhanced sensor design, its basic setup, and its challenges as well as prospects are presented.…”

Section: Planar Multipole Resonance Probementioning

confidence: 99%

“…Hence, novel planar sensor concepts have come into focus. We have presented a first planar assembly in [22].…”

Section: Introductionmentioning

confidence: 99%

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The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor

Schulz

Styrnoll

Awakowicz

et al. 2015

IEEE Trans. Instrum. Meas.

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A novel compact plasma sensor applicable for the supervision and control of industrial plasma processes is presented in this contribution. Based on the multipole resonance probe (MRP), the new planar MRP (pMRP) is introduced as a powerful and economical monitoring tool, flush-mounted into the reactor wall. Hence, it can be used for an effective suppression of disturbances of the plasma process itself. Using 3D electromagnetic field simulations with CST Microwave Studio, the pMRP is investigated and challenges as well as prospects of the new sensor design are discussed in detail. Three different sensor versions are presented and compared with the resonance behavior of the MRP. Furthermore, limitations concerning position tolerances are shown and the suitability of the pMRP is proven. Measurements in a double inductive coupled plasma, with argon as process gas and varying excitation powers, demonstrate the suitability of the pMRP for monitoring purposes. Index Terms-3D electromagnetic field simulations, active plasma resonance spectroscopy (APRS), double inductive coupled plasma (DICP), Drude model, multipole resonance probe (MRP), planar plasma sensor, sensor applications.

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Section: Multipole Resonance Probementioning

confidence: 99%

Section: Planar Multipole Resonance Probementioning

confidence: 99%

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The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor

Schulz

Styrnoll

Awakowicz

et al. 2015

IEEE Trans. Instrum. Meas.

Self Cite

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“…In the past decade, several planar-type APRS probes have been developed, such as the planar multipole resonance probe (pMRP) [10][11][12][13][14][15][16], curling probe [17][18][19], and flat cutoff probe [20][21][22]. These probes can be flatly embedded into the chamber wall or chuck for minimally invasive process monitoring.…”

Section: Introductionmentioning

confidence: 99%

“…I. Previous work has studied the pMRP with the Drude model [10][11][12][13][14][15][16] and collision-less kinetic model [16]. The collision-less kinetic model ignores all collisions, and it only applies to the low-pressure plasma (a few Pa).…”

Section: Introductionmentioning

confidence: 99%

Kinetic investigation of the planar Multipole Resonance Probe under arbitrary pressure

Wang¹,

Friedrichs²,

Oberrath³

et al. 2021

Preprint

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Active plasma resonance spectroscopy (APRS) refers to a class of plasma diagnostic methods that use the ability of plasma to resonate at or near the electron plasma frequency for diagnostic purposes. The planar multipole resonance probe (pMRP) is an optimized realization of APRS.It has a non-invasive structure and allows simultaneous measurement of electron density, electron temperature, and electron-neutral collision frequency. Previous work has investigated the pMRP through the Drude model and collision-less kinetic model. The Drude model misses important kinetic effects such as collision-less kinetic damping. The collision-less kinetic model is able to capture pure kinetic effects. However, it is only applicable to the low-pressure plasma. To further study the behavior of the pMRP, we develop a collisional kinetic model in this paper, which applies to arbitrary pressure. In this model, the kinetic equation is coupled to the Poisson equation under the electrostatic approximation. The real part of the general admittance is calculated to describe the spectral response of the probe-plasma system. Both collision-less kinetic damping and collisional damping appear in the spectrum. This model provides a possibility to calculate the electron density, electron temperature, and electron-neutral collision frequency from the measurements.

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Development of a ridged microstrip microwave interferometer for plasma electron density measurements

Hsieh¹,

Liang²,

Jeng³

et al. 2015

Plasma Sources Sci. Technol.

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Here we report the development of a microwave interferometer based on a ridged microstrip transmission line structure for the monitoring of plasma density in plasma processing tools. A special ridged shaped microstrip structure with a quartz dielectric is adopted for yielding a large phase shift of the microwave, and thus a higher sensitivity of the interferometer. During operation, the plasma density sensor is installed on the chamber wall where the microstrip transmission line is immersed in plasma and a microwave is launched from one end of the line and exits through the other end. As in conventional microwave interferometers, the plasma density is determined by the phase shift of the microwave propagating through the transmission line. 3D electromagnetic numerical simulations, where plasma is treated as a dielectric medium having a plasma permittivity determined by plasma density and microwave frequency, were employed to determine the phase shift/plasma density relation of this sensor. The sensor is designed to operate at 2.4 GHz microwave frequency, with a compact size and materials that are compatible with most plasma processing tools. Measurement results show that plasma density measured by the sensor, although placed at the chamber wall, does reflect the variations of the plasma density near the chamber center. In the real-time plasma etch process, the dependence of plasma densities on source powers and pressures measured by the sensor is also consistent with the results of ion current on the wafer electrode obtained from an impedance meter.

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A new approach on advanced compact plasma sensors for industrial plasma applications

Cited by 7 publications

References 14 publications

The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor

The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor

Kinetic investigation of the planar Multipole Resonance Probe under arbitrary pressure

Development of a ridged microstrip microwave interferometer for plasma electron density measurements

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