2015
DOI: 10.1016/j.jcis.2015.02.027
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A new plasmonic device made of gold nanoparticles and temperature responsive polymer brush on a silicon substrate

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Cited by 13 publications
(5 citation statements)
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“…Alkoxysilyl groups are useful tools for preparing hybrid composites by forming a bridge between an organic matrix and inorganic surface through [Si-O-Si] covalent bonds. [SiO-R-X]-type molecules are used to modify silicon or silica surfaces (SiO- is an alkoxysilyl group and -X is a halogen group) and, after further modification, can act as initiators for controlled radical polymerization (CRP) methods [20,21] or living anionic polymerization (LAP) [22]. However, LAP, even if conducted at low temperature, is unsuitable for synthesizing alkoxysilyl-functionalized polymers because of the unavoidable side reactions between the alkoxysilyl groups and the living species [18].…”
Section: Resultsmentioning
confidence: 99%
“…Alkoxysilyl groups are useful tools for preparing hybrid composites by forming a bridge between an organic matrix and inorganic surface through [Si-O-Si] covalent bonds. [SiO-R-X]-type molecules are used to modify silicon or silica surfaces (SiO- is an alkoxysilyl group and -X is a halogen group) and, after further modification, can act as initiators for controlled radical polymerization (CRP) methods [20,21] or living anionic polymerization (LAP) [22]. However, LAP, even if conducted at low temperature, is unsuitable for synthesizing alkoxysilyl-functionalized polymers because of the unavoidable side reactions between the alkoxysilyl groups and the living species [18].…”
Section: Resultsmentioning
confidence: 99%
“…Poly­(DEGMA) brushes were synthesized on glass substrates via an interface-mediated RAFT polymerization method according to the literature. In a typical process, the substrates were first cleaned with ethanol and deionized (DI) water in an ultrasonic bath for 10 min and then dried under nitrogen gas flow. After the pre-cleaning process, they were immersed in piranha solution for 1 h at 70 °C, washed with DI water several times, and dried with nitrogen gas.…”
Section: Methodsmentioning
confidence: 99%
“…The chip composed of temperature‐sensitive poly(MEO 2 ‐MA)‐SH and Au NPs was prepared as described in our previous report . Briefly, a CDSP‐immobilized silicon substrate oriented normal to the base of the reactor, MEO 2 ‐MA (150 mmol), free reversible addition‐fragmentation chain transfer (RAFT) agent CDSP (1.2 mmol), initiator AIBN (0.24 mmol), and DMF (35 ml) were put into a glass reactor and degassed by purging with nitrogen for 30 min.…”
Section: Experimental Partmentioning
confidence: 99%