A new solution route for the synthesis of silicon nanoparticles presenting different surface substituents, Part II

Arquier, Damien; Calleja, Gérard; Granier, Michel; Cerveau, Geneviève; Corriu, Robert J. P.

doi:10.1016/j.crci.2008.06.008

Cited by 2 publications

(2 citation statements)

References 33 publications

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“…37,42 By modifying the surface of Cl-passivated Si NCs, Arquier et al experimentally obtained NC surface with alkyl, alkoxyl, and amino ligands. 43,44 They found that surface modification did not result in changes of the PL from Si NCs, consistent with 1) led to a redshift of the PL from Si NCs. 45 This actually indicated that surface chemistry effect should be taken into account in the surface modification of Cl-passivated Si NCs.…”

Section: Introductionmentioning

confidence: 59%

Surface modification of chlorine-passivated silicon nanocrystals

Wang

Yang

2013

Phys. Chem. Chem. Phys.

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Theoretical understanding of the surface modification of Cl-passivated silicon nanocrystals (Si NCs) is rather limited, in stark contrast to that for H-passivated Si NCs. We now investigate four surface-modification schemes (silanization, alkylation, alkoxylation and aminization) that have been experimentally adopted for Cl-passivated Si NCs in the framework of density functional theory. It is found that aminization most significantly affects the electronic structures of Si NCs by raising the highest occupied molecular orbital (HOMO). The effect of aminization depends on the substituents of amines, rather than the coverage of amine-derived ligands at the NC surface. The lowest unoccupied molecular orbital (LUMO) is more sensitive to the NC size than the HOMO. Only the HOMO is sensitive to surface modification. All the aminization leads to the decrease of the HOMO-LUMO gap despite that the dominant role of quantum confinement effect is maintained in most cases. The current results contribute to the understanding of the optical behavior of Si NCs derived from the surface modification of Cl-passivated ones.

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Section: Introductionmentioning

confidence: 59%

Surface modification of chlorine-passivated silicon nanocrystals

Wang

Yang

2013

Phys. Chem. Chem. Phys.

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“…SiCl4 is used as silicon source material for the production of organosilicates, silicon esters, organosilicon halides, silicone polymers, etc. SiCl 4 nowadays, is also used for the manufacturing of solar-grade (1-2) polycrystalline Si (3)(4)(5), nanocrystalline Si (6), Si nanowires (7), Si nanoparticles (8)(9), high purity SiO 2 (10), high porosity SiO 2 (11)(12) SiC (13)(14)(15)(16)(17)(18) and Si 3 N 4 (19)(20). In the industry, SiCl 4 is produced as a by-product along with other metal chlorides or by the direct chlorination of SiC, ferrosilicon, or SiO 2 /C mixture with chlorine gas.…”

Section: Introductionmentioning

confidence: 99%

Direct Solid-State Electrochemical Synthesis of Silicon Tetrachloride from Silica at Ambient Temperatures and Pressures

Ariwahjoedi

Fuad

Ariefin³

2010

ECS Trans.

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Silicon tetrachloride (SiCl4) is one of the most important chemical compounds in the microelectronic industries. Commercial scale synthesis of SiCl4 is usually performed by roasting silica (SiO2) and cokes (C) under flowing chlorine (Cl2) gas at temperatures {greater than or equal to}900oC. At room temperatures and atmospheric pressures, the formation of SiCl4 from Cl2, SiO2 and C can be calculated to be favorable with ΔGreaction as low as -120.77 kJ/mol. This paper reports the use of I-V characterization technique in ambient conditions SiCl4 synthesis via direct solid state electrochemical synthesis reaction, starting with sodium chloride (NaCl), rice-husk derived-SiO2, and C (graphite/charcoal mixture).

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A new solution route for the synthesis of silicon nanoparticles presenting different surface substituents, Part II

Abstract: International audienc

Cited by 2 publications

References 33 publications

Surface modification of chlorine-passivated silicon nanocrystals

Surface modification of chlorine-passivated silicon nanocrystals

Direct Solid-State Electrochemical Synthesis of Silicon Tetrachloride from Silica at Ambient Temperatures and Pressures

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