2012 International Electron Devices Meeting 2012
DOI: 10.1109/iedm.2012.6479084
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A non-linear ReRAM cell with sub-1μA ultralow operating current for high density vertical resistive memory (VRRAM)

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Cited by 46 publications
(27 citation statements)
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“…This type of conduction might be from the Poole-Frenkel (PF) emission process. 40 To check the PF process in this region, ln (I/V) was plotted against V 1/2 and a linear relationship was obtained for all the measurement temperatures, which reveals that the current conduction is dominated by PF emission, 41 as shown in Fig. 3(f).…”
mentioning
confidence: 93%
“…This type of conduction might be from the Poole-Frenkel (PF) emission process. 40 To check the PF process in this region, ln (I/V) was plotted against V 1/2 and a linear relationship was obtained for all the measurement temperatures, which reveals that the current conduction is dominated by PF emission, 41 as shown in Fig. 3(f).…”
mentioning
confidence: 93%
“…7,8 Other interesting approach is to stack the devices 3-dimensionally, for which two feasible architectures of crossbar and vertical RRAM are reported. 9 However, both the methods require complex experimental processes and may suffer from other limitations. Another alternative and simpler way to increase storage density is to use multilevel cell (MLC) storage technology, in which more than one bit per cell can be stored without further decreasing the physical device size.…”
mentioning
confidence: 99%
“…However, in this study, we chose a ReRAM device with low current compliance and high LRS on purpose, in order to minimize the size of the programming transistors and the write/read energies, while accepting a low HRS/LRS ratio. Note as well that this HRS/LRS ratio, smaller than two, can be considered a worst case ratio with respect to the impact of variability compared to other devices, but it does neither significantly decrease the endurance, nor increase the variability [16]. In the following, we show that under this worst case assumption, it is still possible to obtain robust NVFF operation even at low voltages with proper circuit design.…”
Section: Resistive Memory: Manufacturing Process and Switching Chmentioning
confidence: 79%