A novel atmospheric pressure technique for the deposition of ZnS by atomic layer epitaxy using dimethylzinc

Hunter, Adolph; Kitai, Adrian

doi:10.1016/0022-0248(88)90374-0

Cited by 31 publications

(15 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The structure and morphology of these films are better than those obtained by A L E at 25~ (74) and are comparable with those of other polycrystalline films deposited from the vapor phase by E B E at room temperature (75)(76)(77) or at 180~ (80), and with Z n S e films deposited by reactive m a g n e t r o n sputtering at 150~ (79). ZnS films deposited by E B E on unheated A1203 have a high density of microtwins, show surface roughness, and are also strained by extension (75,76).…”

Section: Polycrystalline Zns Cds and Zcs Films--as Is Seen Inmentioning

confidence: 68%

ZnS , CdS , and Zn1 − x Cd x S Thin Films Deposited by the Successive Ionic Layer Adsorption and Reaction Process

Nicolau

Dupuy

Brunel

1990

J. Electrochem. Soc.

214

View full text Add to dashboard Cite

The results of the structural, optical, and electrical characterization of ZnS, CdS, and Zn~_~CdxS films grown by the successive ionic layer adsorption and reaction process are presented. Polycrystalline cubic ZnS and hexagonal CdS films grown on glass and on indium-tin oxide covered glass have mean crystallite sizes Dl = 6.5 nm and Dll = 4 nm, and Dl = 30 nm and DII = 15 nm, respectively, perpendicular and parallel to the film. The pure cubic 3C phase is obtained from x = 0 up to x = 0.75 and the pure hexagonal 2H phase from x ~ 0.75 up to x = 1. Texturized heteroepitaxial films of hexagonal CdS have been grown on (111), (001), and (110) Ge, on (1 1 1), (001), an_d_(ll0) GaAs and on (1 1 1) InP substrates. Strongly texturized heteroepitaxial films of cubic ZnS have been grown on (1 1 1) InP and on (001) GaAs. Polycrystalline ZnS films consist of densely packed microcrystalline fibrous grains belonging to the transition zone T in Thornton's structural zone model. Polycrystalline CdS films show a strong <0001> preferred orientation and have a compact columnar structure belonging to Thornton's zone 2. ZnS and CdS films have a refractive index ranging from 2.1 to 2.25 and from 2.15 to 2.35, respectively.

show abstract

Section: Polycrystalline Zns Cds and Zcs Films--as Is Seen Inmentioning

confidence: 68%

ZnS , CdS , and Zn1 − x Cd x S Thin Films Deposited by the Successive Ionic Layer Adsorption and Reaction Process

Nicolau

Dupuy

Brunel

1990

J. Electrochem. Soc.

214

View full text Add to dashboard Cite

show abstract

“…In recent years we have applied Atomic Layer Deposition (ALD) [26,27] to silicon and silica substrates to access a range of materials that are not available in a form suitable for surface force studies. This process involves a twostep gas phase chemical reaction that results in the production of a single conformal monolayer of material being grown on the surface during each cycle.…”

Section: Atomic Layer Deposition For Producing New Surfaces For Forcementioning

confidence: 99%

Surface Forces in Particle Technology: Wet Systems

Eom

Walsh

Parsons

et al. 2015

Procedia Engineering

View full text Add to dashboard Cite

Surface forces play a fundamental role in particle processing as they control the stability, adhesion, friction and rheology of particulate systems and information on all of these can be obtained from an analysis of the normal forces measured between particles. Therefore particle processing at all stages can be informed by knowledge of the forces between the constituent particles. For wet particles systems, the interaction forces between two particles can rarely be predicted from theory, but rather requires experimentation or direct measurement. This requires that the surfaces used have the same as surface properties as the particles. In practice this is rarely possible, as surface force measurements require surfaces with extremely low roughness and precise geometry and the majority of materials do not conform to these requirements. To address these challenges we produce surfaces of low roughness and controlled chemistry using Atomic Layer Deposition (ALD) and are developing methods to calculate and understand the influence of surface roughness on the measured forces. Here we report the forces between hafnia surfaces produced by ALD and show that like ALD produced titania surfaces and silica surfaces, the expected van der Waals forces at high pH are not manifest, suggesting that most real surfaces have unexpectedly repulsive surface forces at high pH and small separations. This will fundamentally alter how these particulate systems behave when being processed, reducing the adhesion and the friction and enhancing the stability compared to the expected interaction from DLVO theory.

show abstract

“…Atomic Layer Deposition (ALD), formerly known as atomic layer epitaxy, is nowadays a well-stablished technique allowing for the deposition of smooth and pinhole-free thin films of several materials, namely oxides, nitrides, and sulfides, among others [ 1 , 2 , 3 ]. Furthermore, ALD enables the deposition of conformal coatings even in three-dimensional, high aspect ratio nanostructured substrates, while keeping an accurate control on the thickness and stoichiometry of the deposits [ 4 ].…”

Section: Introductionmentioning

confidence: 99%

Surface Modification of Nanoporous Anodic Alumina during Self-Catalytic Atomic Layer Deposition of Silicon Dioxide from (3-Aminopropyl)Triethoxysilane

et al. 2021

View full text Add to dashboard Cite

Changes associated to atomic layer deposition (ALD) of SiO2 from 3-aminopropyl triethoxysilane (APTES) and O3, on a nanoporous alumina structure, obtained by two-step electrochemical anodization in oxalic acid electrolyte (Ox sample) are analysed. A reduction of 16% in pore size for the Ox sample, used as support, was determined by SEM analysis after its coverage by a SiO2 layer (Ox+SiO2 sample), independently of APTES or O3 modification (Ox+SiO2/APTES and Ox+SiO2/APTES/O3 samples). Chemical surface modification was determined by X-ray photoelectron spectroscopy (XPS) technique during the different stages of the ALD process, and differences induced at the surface level on the Ox nanoporous alumina substrate seem to affect interfacial effects of both samples when they are in contact with an electrolyte solution according to electrochemical impedance spectroscopy (EIS) measurements, or their refraction index as determined by spectroscopic ellipsometry (SE) technique. However, no substantial differences in properties related to the nanoporous structure of anodic alumina (photoluminescent (PL) character or geometrical parameters) were observed between Ox+SiO2/APTES and Ox+SiO2/APTES/O3 samples.

show abstract

A novel atmospheric pressure technique for the deposition of ZnS by atomic layer epitaxy using dimethylzinc

Cited by 31 publications

References 10 publications

ZnS , CdS , and Zn1 − x Cd x S Thin Films Deposited by the Successive Ionic Layer Adsorption and Reaction Process

ZnS , CdS , and Zn1 − x Cd x S Thin Films Deposited by the Successive Ionic Layer Adsorption and Reaction Process

Surface Forces in Particle Technology: Wet Systems

Surface Modification of Nanoporous Anodic Alumina during Self-Catalytic Atomic Layer Deposition of Silicon Dioxide from (3-Aminopropyl)Triethoxysilane

Contact Info

Product

Resources

About