2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407)
DOI: 10.1109/vlsit.2003.1221100
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A novel self-aligned shallow trench isolation cell for 90 nm 4 Gbit NAND flash EEPROMs

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Cited by 9 publications
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“…The V th level of the neighboring cells is changed due to FG-FG coupling. 15,16) Figure 6 illustrates the write order and V TH distribution of TLC NAND flash memories. In TLC NAND flash memories, before the precise write in the verify programming, the rough write to neighboring cells should be carries out to prevent FG-FG coupling effect.…”
Section: Tlc Nand Flash Memory Basicsmentioning
confidence: 99%
“…The V th level of the neighboring cells is changed due to FG-FG coupling. 15,16) Figure 6 illustrates the write order and V TH distribution of TLC NAND flash memories. In TLC NAND flash memories, before the precise write in the verify programming, the rough write to neighboring cells should be carries out to prevent FG-FG coupling effect.…”
Section: Tlc Nand Flash Memory Basicsmentioning
confidence: 99%
“…The FG-FG coupling increases the V TH of the neighboring memory cells [21][22][23]. These mechanisms cause the increment of program-disturb error.…”
Section: A Analyses Of Error Rate Of Each V Th State For Program-dismentioning
confidence: 99%
“…The coupling ratio is obtained by using top and sidewall of floating gate, and the interference between floating gates is effectively suppressed by this control gate shielding between adjacent cells. This approach also involves three-dimensional use of cell [11][12][13].…”
Section: Nand Flash Memorymentioning
confidence: 99%