A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry

Fukui, Ryosuke; Kim, Jangwoo; Matsuyama, Satoshi; Yumoto, Hirokatsu; Inubushi, Yuichi; Tono, Kensuke; Koyama, Takahisa; Kimura, Takashi; Mimura, Hidekazu; Ohashi, Haruhiko; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto

doi:10.1080/08940886.2013.832585

Cited by 11 publications

(6 citation statements)

References 43 publications

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“…30 After the reconstruction of the wavefront shape, the quadratic function, which indicates the defocus component, was subtracted from the wavefront shape. Furthermore, the coma aberration caused by an incidence angle error of the focusing mirror 38 was subtracted. Then, the component left is expressed as the wavefront aberration.…”

Section: Focusing System and Experimental Setupmentioning

confidence: 99%

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

Inoue

Matsuyama

Kawai

et al. 2018

Review of Scientific Instruments

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In this study, the systematic errors of an X-ray single-grating interferometer based on the Talbot effect were investigated in detail. Non-negligible systematic errors induced by an X-ray camera were identified and a method to eliminate the systematic error was proposed. Systematic-error-free measurements of the wavefront error produced by multilayer focusing mirrors with large numerical apertures were demonstrated at the SPring-8 Angstrom Compact free electron LAser. Consequently, wavefront aberration obtained with two different cameras was found to be consistent with an accuracy better than λ/12.

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Section: Focusing System and Experimental Setupmentioning

confidence: 99%

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

Inoue

Matsuyama

Kawai

et al. 2018

Review of Scientific Instruments

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“…For reasons of completeness it should be mentioned that, for focusing optics with short working distances producing X-ray beams with a pronounced divergence, single-grating setups present an option since the divergence produces a sufficient magnification to resolve the interference fringes with an adequate camera system (Yumoto et al, 2006;Yuan et al, 2011;Nilsson et al, 2012;Matsuyama et al, 2012;Fukui et al, 2013;Uhlé n et al, 2014). Otherwise, the diffraction and the absorption grating need to be divergence-matched in order to account for the magnification of the interference fringes induced by the beam divergence.…”

Section: Figure 11mentioning

confidence: 99%

X-ray grating interferometer for in situ and at-wavelength wavefront metrology

Kayser

Dávid

Flechsig

et al. 2017

J Synchrotron Radiat

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Edited by M. Yabashi, RIKEN SPring-8 Center, JapanKeywords: X-ray grating interferometry; wavefront metrology; X-ray optics; XFELs.X-ray grating interferometer for in situ and at-wavelength wavefront metrology Yves Kayser,* Christian David, Uwe Flechsig, Juraj Krempasky, Volker Schlott and Rafael Abela Paul Scherrer Institut, 5232 Villigen PSI, Switzerland. *Correspondence e-mail: yves.kayser@psi.ch A wavefront metrology setup based on the X-ray grating interferometry technique for spatially resolved, quantitative, in situ and at-wavelength measurements of the wavefront at synchrotron radiation and hard X-ray freeelectron laser beamlines is reported. Indeed, the ever-increasing demands on the optical components to preserve the wavefront shape and the coherence of the delivered X-ray beam call for more and more sensitive diagnostic instruments. Thanks to its angular sensitivity, X-ray grating interferometry has been established in recent years as an adequate wavefront-sensing technique for quantitatively assessing the quality of the X-ray wavefront under working conditions and hence for the in situ investigation of X-ray optical elements. In order to characterize the optical elements at any given beamline by measuring the aberrations introduced in the wavefront, a transportable X-ray grating interferometry setup was realised at the Swiss Light Source (SLS). The instrument, which is expected to be a valuable tool for investigating the quality of the X-ray beam delivered at an endstation, will be described hereafter in terms of the hardware setup and the related data analysis procedure. Several exemplary experiments performed at the X05DA Optics beamline of the SLS will be presented.

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“…Third, distortion of the wavefront due to the optics themselves should be avoided wherever possible (Yamauchi et al, 2005). Fourth, the optics should be aligned precisely to achieve optimal operation (Fukui et al, 2013). To satisfy the first two conditions, totalreflection mirrors are the most favorable optics.…”

Section: Introductionmentioning

confidence: 99%

Nanofocusing of X-ray free-electron lasers by grazing-incidence reflective optics

Yamauchi

Yabashi

Ohashi

et al. 2015

J Synchrotron Radiat

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Total-reflection mirror devices for X-ray free-electron laser focusing are discussed in terms of optical design, mirror-fabrication technology, a wavefront diagnosis method and radiation-damage testing, as a review of the present status of the focusing optics at the SPring-8 angstrom compact free-electron laser (SACLA). Designed beam sizes of 1 mm and 50 nm, and spot sizes almost matching prediction have been achieved and used to explore topics at the forefront of natural science. The feasibility of these devices is determined to be sufficient for long-term and stable operation at SACLA by investigating the radiation-damage threshold and achievable accuracies in the mirror figure and alignment.

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A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry

Cited by 11 publications

References 43 publications

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

X-ray grating interferometer for in situ and at-wavelength wavefront metrology

Nanofocusing of X-ray free-electron lasers by grazing-incidence reflective optics

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