“…Accompanying the development of III-nitrides materials and devices, increasing attention has been paid to the GaNbased resonate tunneling diode (RTD) because of its excellent properties such as wider direct band gap, larger band offset, higher peak electron velocity, higher critical breakdown voltage and higher thermal stability than those of GaAs/Al-GaAs and Si/GeSi counterparts [1][2][3][4][5][6][7][8][9][10] . In particular, conduction band offsets in the InGaN/AlGaN system are larger than those in the InGaAs/AlGaAs system and a built-in electric field exists owing to the piezoelectric polarization effects, the former appeared to have very interesting negative differential resistance (NDR) related properties and became considerably attractive during the last decade [1, 3-5, 7, 8, 10] .…”