2022
DOI: 10.1007/s13369-022-06821-6
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A Single-Bitline 9T SRAM for Low-Power Near-Threshold Operation in FinFET Technology

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Cited by 20 publications
(4 citation statements)
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“…Complementary metal‐oxide‐semiconductor (CMOS) technology scaling has become the main key to continuous progress in the silicon‐based semiconductor industry over the past three decades. However, as the technology scaling enters beyond 32 nm regime, CMOS devices face many serious problems such as increased leakage currents, difficulty with an increase in ON ‐current, large parametric variations, low reliability, increase in manufacturing cost, etc 6–10 . So, there is a need to look for different potential alternatives to CMOS.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Complementary metal‐oxide‐semiconductor (CMOS) technology scaling has become the main key to continuous progress in the silicon‐based semiconductor industry over the past three decades. However, as the technology scaling enters beyond 32 nm regime, CMOS devices face many serious problems such as increased leakage currents, difficulty with an increase in ON ‐current, large parametric variations, low reliability, increase in manufacturing cost, etc 6–10 . So, there is a need to look for different potential alternatives to CMOS.…”
Section: Introductionmentioning
confidence: 99%
“…However, as the technology scaling enters beyond 32 nm regime, CMOS devices face many serious problems such as increased leakage currents, difficulty with an increase in ON-current, large parametric variations, low reliability, increase in manufacturing cost, etc. [6][7][8][9][10] So, there is a need to look for different potential alternatives to CMOS. It is found that carbon nanotube field-effect transistors (CNTFET) and graphene nanoribbon field-effect transistors (GNRFET) have a higher power of switch, curves with more ideal voltage, and better mobility, consequently, they can be favorable replacements for CMOS.…”
mentioning
confidence: 99%
“…8 The extended CMOS devices comprise nanowire field effect transistors(nanowire FET), 15 Carbon nanotube field effect transistors (CNTFET), 16 graphene nano-ribbon field effect transistors (GNRFET), 17 negative-capacitance field-effect transistor (NC-FET), 18 Spin field effect transistor (SPIN FET) 19 etc.. However, the beyond CMOS devices include Fin Shaped Field Effect Transistor (FinFET), 20 Tunnel field effect transistor (TFET) [21][22][23][24][25] etc.…”
mentioning
confidence: 99%
“…[4][5][6][7] These problems reduce the suitability of the MOSFET for power/energy-efficient applications. 5 In response, researchers have proposed various new alternative solutions and technologies to traditional MOSFET technology, such as fin-based FET (FinFET), [8][9][10][11][12][13][14] carbon nanotube-based FET (CNTFET), 6,7,15,16 and graphene nanoribbon-based FET (GNRFET). 4,[17][18][19] Among these emerging technologies, GNRFET offers excellent properties and is compatible with existing silicon-based MOSFET, and is an attractive option for achieving higher performance and efficiency in future electronic devices.…”
mentioning
confidence: 99%