A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp

Abstract

Poly(methylmethacrylate) adsorption onto flat substrates of glass and silica: Influence of water traces in solvent AIP Conf.

Subpicosecond vacuum ultraviolet laser system for advanced materials processing

“…These photon energies are high enough to induce one-photon interactions to almost all materials. We have demonstrated several processing results by use of such high photon energies of the VUV excimer lamps, such as SiO 2 thin layer deposition [3,5] and amorphous Si film production [6]. In such applications, high-intensity laser beam was not always necessary.…”

“…As a result, we have realized nano-range surface alteration of transparent materials such as SiO 2 by use of the Ar 2 * excimer lamp emission at 126 nm, where Si atoms were precipitated on a SiO 2 film by removing Si-O bonds [2]. Good quality SiO 2 thin films were also produced by irradiating Xe 2 * excimer emission at 172 nm on TEOS (tetraethyl orthosilicate) gas [3]. By using coherent VUV lasers, the submicron spatial resolution attributed to the emission wavelengths would be added to this kind of nano-scale surface interactions.…”

Electrical Approach of Homogenous High Pressure Ne/Xe/HCl Dielectric Barrier Discharge for XeCl (308 nm) Lamp

“…Electron quenching (cm 3 [44] voltage rise-times for the plasma excitation produces more uniform spatial discharge with high efficiency. Figure 2a shows the time evolution of the current density deduced from the model.…”

“…The fundamental uses of VUV/UV radiation can be classified according to their functional behavior as an energy or information carrier, or as a specific, ecologically friendly and clean agent in form of photons. Excimer formation in DBDs, originally proposed for use in high-power ultraviolet lamps by Eliasson and Kogelschatz [1], has become a subject of great technical importance, for a A variety of applications in environmental and materials processing, such as UV biological sterilization, photochemical surface treatment, pollution control, plasma display panels, ozone generation, microlithography, photolytic vapor deposition and material deposition in microelectronics [2][3][4][5][6][7][8][9][10]. It has been investigated using many different excited species, including rare gas excimers, molecular rare gas-halide excimers, and halogen dimers [1,[11][12][13][14][15][16][17].…”

Quasi-point incoherent ArF∗ excimer emission source at 193 nm using a laser-produced plasma

“…With regard to the photoinduced reactions, low-power, incoherent lamp emission, rather than intense laser emission, may be adequate to some applications such as large surface treatment of soft materials. Discharge-excited lamps using rare gas excimers, Ar * 2 , Kr * 2 , and Xe * 2 , have been developed for many applications [10][11][12]. Discharge-excited excimer lamps using fluorine gas such as F * 2 , KrF * , and ArF * may face the technical problem of limited operation lifetime caused by fluorine consumption.…”