2023
DOI: 10.1007/s11182-023-02801-x
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A Study of Complex Defect Formation in Silicon Doped With Nickel

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“…It is also assumed that the temperature interval and time at which diffusion of nickel atoms into silicon is carried out leads to the dissolution of any kind of defective associations, precipitates of the second phase, accumulations of impurities, including nickel atoms and their uniform distribution in the silicon lattice, and rapid quenching Si<Ni> samples after diffusion leads to freezing of such a finely dispersed state of Ni atoms in the Si lattice [18][19][20].…”
Section: Description and Analysis Of Resultsmentioning
confidence: 99%
“…It is also assumed that the temperature interval and time at which diffusion of nickel atoms into silicon is carried out leads to the dissolution of any kind of defective associations, precipitates of the second phase, accumulations of impurities, including nickel atoms and their uniform distribution in the silicon lattice, and rapid quenching Si<Ni> samples after diffusion leads to freezing of such a finely dispersed state of Ni atoms in the Si lattice [18][19][20].…”
Section: Description and Analysis Of Resultsmentioning
confidence: 99%