2000
DOI: 10.1002/1097-4539(200009/10)29:5<373::aid-xrs442>3.0.co;2-s
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A systematic database of thin-film measurements by EPMA Part II?Palladium films

Abstract: In succession to our work on aluminium films a systematic database of thin‐film measurements on palladium films by electron probe microanalysis is presented. This time the measurements were performed at accelerating voltages between 4 and 30 kV, again on films of six different nominal thicknesses, ranging from 100 to 3200 Å, which were deposited simultaneously on 20 different substrates, ranging between Be and Bi. The purpose of this work was to provide further systematic data on which thin‐film programs can b… Show more

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Cited by 21 publications
(27 citation statements)
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“…A simulated profile along z is shown in the lower part of Figure 5. Experimental profiles along z were extracted from the thin-films database of Bastin & Heijligers (2000 a , 2000 b ) considering the film thicknesses as equivalent to the subsequent milled surface.
Figure 5Enhanced quantification applied on a simulated profile along z . The thin-film samples and beams position are defined at the top.
…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…A simulated profile along z is shown in the lower part of Figure 5. Experimental profiles along z were extracted from the thin-films database of Bastin & Heijligers (2000 a , 2000 b ) considering the film thicknesses as equivalent to the subsequent milled surface.
Figure 5Enhanced quantification applied on a simulated profile along z . The thin-film samples and beams position are defined at the top.
…”
Section: Resultsmentioning
confidence: 99%
“…(A) Thin-film samples were accurately characterized by Bastin & Heijligers (2000 a , 2000 b ). They established a database containing X-ray intensities measured by wave length spectrometry (WDS) on thin films.…”
Section: Methodsmentioning
confidence: 99%
“…In detail, k ‐values are plotted against beam voltage and fitted with calculated k ‐values with elemental composition and thickness as free parameters. A layer density of 12.0 g/cm 3 was estimated …”
Section: Methodsmentioning
confidence: 99%
“…A layer density of 12.0 g/cm 3 was estimated. [7] Surface analysis by AES and XPS AES measurements were performed with a Physical Electronics PHI 700 TM Scanning Auger Nanoprobe. The spectra were taken at 5-kV beam voltage and 20-nA beam current.…”
Section: Ed-epma/stratagemmentioning
confidence: 99%
“…Stanford [173] in 2020 measured the oxide layer formation on Pu from 35 nm to 400 nm using measured standards to build the k-ratio calibration curves of oxygen through FIM-SEM analysis. Previously, Bastin made a massive study collecting the K-ratios of Al [174] and Pd [175] of films from 10 to 320 nm in thickness at various beam energies between 3 kV and 30 kV on many substrates between Be and Bi.…”
Section: Electron Probe Microanalysismentioning
confidence: 99%