2009
DOI: 10.1166/nnl.2009.1020
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A Template Metal-Organic Chemical Vapour Deposition Route to the Fabrication of Free Standing Co<SUB>3</SUB>O<SUB>4</SUB> Nanotube Arrays

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“…Moreover, the characteristic of serial processing yields relatively small patterned area, which limits their use for high throughput and large-scale demonstration. Unlike these processes, other alternatives, such as chemical vapor deposition (CVD), 17 self-assembly of nanoparticles, 18 or template-assisted evaporation method 19 allow for parallel processing in a relatively accessible way. …”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the characteristic of serial processing yields relatively small patterned area, which limits their use for high throughput and large-scale demonstration. Unlike these processes, other alternatives, such as chemical vapor deposition (CVD), 17 self-assembly of nanoparticles, 18 or template-assisted evaporation method 19 allow for parallel processing in a relatively accessible way. …”
Section: Introductionmentioning
confidence: 99%