2009 IEEE International Conference on Microelectronic Test Structures 2009
DOI: 10.1109/icmts.2009.4814622
|View full text |Cite
|
Sign up to set email alerts
|

A Test Structure for Statistical Evaluation of Characteristics Variability in a Very Large Number of MOSFETs

Abstract: We have proposed and developed a test structure for evaluating electrical characteristics variability of a large number of MOSFETs in very short time using very simple circuit structure.The electrical characteristics such as threshold voltage, subthreshold swings (S-factors, random telegraph signal noise, and so on, can be measured in over one million MOSFETs. This new test structure circuit and results measured by this circuit are very efficient in developing processes, process equipment and device structure … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
8
0

Year Published

2009
2009
2014
2014

Publication Types

Select...
4
2

Relationship

0
6

Authors

Journals

citations
Cited by 14 publications
(8 citation statements)
references
References 7 publications
0
8
0
Order By: Relevance
“…Figure 2 shows the circuit diagram of array test circuit for the evaluation of numerous MOSFETs. [19][20][21][22] In this test circuit, device under test (DUT) cells are consisted of measured and row switch transistors. And the DUT cells are placed in an arrayed pattern.…”
Section: Experimental Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Figure 2 shows the circuit diagram of array test circuit for the evaluation of numerous MOSFETs. [19][20][21][22] In this test circuit, device under test (DUT) cells are consisted of measured and row switch transistors. And the DUT cells are placed in an arrayed pattern.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Using the test circuit, we can measure both the variation of I D -V GS characteristics and RTN characteristics from a large number of MOSFETs. [19][20][21][22][23] When a particular cell shows RTN, we can specify and observe it as dynamic fluctuation of V GS in the time scale. After identifying the MOSFETs showing RTN, the I D dependence of RTN characteristics in these MOSFETs are evaluated in detail by high-speed measurements with sampling period of 1 µs by fixing the shift registers addresses.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…As a result, (17) can thus be decomposed into functions of the individual parameters, as shown in (18).…”
Section: Mle-based Variability Sensing Methodologymentioning
confidence: 99%
“…To derive the coefficients of polynomial functions in equation set (18), a device behavioral model encompassing parameter variations is built first. The xnwFET device structure is extensively characterized through variation-aware 3-D physics based simulations using Synopsys Sentaurus tools [14].…”
Section: Mle-based Variability Sensing Methodologymentioning
confidence: 99%
See 1 more Smart Citation