2004
DOI: 10.1016/j.jcrysgro.2004.03.028
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A two-step metal organic vapor phase epitaxy growth method for high-quality ZnO on GaN/Al2O3 (0001)

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Cited by 53 publications
(51 citation statements)
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“…For the past ten years, ZnO epilayer, ZnO nanorods, and various ZnO nanostructures have been grown by various techniques, including molecular beam epitaxy, 1-4 metal organic vapor phase epitaxy or metal organic chemical vapor deposition, [5][6][7][8][9][10] pulsed laser deposition, 11,12 vapor-liquid-solid ͑VLS͒ catalytic growth technique, [13][14][15] magnetron sputtering, 16 and chemical bath deposition ͑CBD͒. [17][18][19] A major advantage for ZnO nanostructures, e.g., nanowires and nanorods, is that they can be easily grown on various substrates and nonlattice materials including flexible polymers.…”
Section: Introductionmentioning
confidence: 99%
“…For the past ten years, ZnO epilayer, ZnO nanorods, and various ZnO nanostructures have been grown by various techniques, including molecular beam epitaxy, 1-4 metal organic vapor phase epitaxy or metal organic chemical vapor deposition, [5][6][7][8][9][10] pulsed laser deposition, 11,12 vapor-liquid-solid ͑VLS͒ catalytic growth technique, [13][14][15] magnetron sputtering, 16 and chemical bath deposition ͑CBD͒. [17][18][19] A major advantage for ZnO nanostructures, e.g., nanowires and nanorods, is that they can be easily grown on various substrates and nonlattice materials including flexible polymers.…”
Section: Introductionmentioning
confidence: 99%
“…Much effort has been made to produce high-quality ZnO epilayers. In the past few years, singlecrystal ZnO films have been grown with metal-organic vapor phase epitaxy [7], pulsed-laser deposition [8], and plasma-assisted molecular beam epitaxy (MBE) [9]. MBE is recognized as a technique for preparing high-quality layers with good thickness and composition uniformity, sharp dopant profiles and interfaces.…”
Section: Introductionmentioning
confidence: 99%
“…The final nominally 2 µm thick ZnO layer is then grown in a second step at high temperature (900 • C) using N 2 O as O-precursor. Details of this optimized growth procedure are given elsewhere [5].…”
Section: Homo/heterointerfacesmentioning
confidence: 99%