IEEE MTT-S International Microwave Symposium Digest, 2005. 2005
DOI: 10.1109/mwsym.2005.1517065
|View full text |Cite
|
Sign up to set email alerts
|

Accelerated optical topography inspection using parameterized model order reduction

Abstract: This paper describes an efficient method for solving an inverse optical scattering problem associated with the optical semiconductor process inspection. The method determines the geometric features of a fabricated structure, from spectroscopic ellipsometry measurements, by combining a parameterized low-order model with an optimization algorithm. We make improvements on the polynomial fittingbased parameterized moment matching technique to extract such model automatically. Since the resulting model is inexpensi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2006
2006
2011
2011

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(1 citation statement)
references
References 13 publications
0
1
0
Order By: Relevance
“…This is a direct extension of the technique developed for the optimization of dynamical systems [2,8]. The moment matching technique (in the projection framework) was successfully applied to two-and multi-parameter models in [7,15] (also see [13] for application to inverse problems). Subspace generation in the multivariate moment matching approach is comparably simple.…”
Section: Introductionmentioning
confidence: 99%
“…This is a direct extension of the technique developed for the optimization of dynamical systems [2,8]. The moment matching technique (in the projection framework) was successfully applied to two-and multi-parameter models in [7,15] (also see [13] for application to inverse problems). Subspace generation in the multivariate moment matching approach is comparably simple.…”
Section: Introductionmentioning
confidence: 99%