Accuracy in CD-SEM metrology

Nikitin, A. V.; Sicignano, Albert; Yeremin, Dmitriy Y.; Sandy, Matthew; Goldburt, E. T.

doi:10.1117/12.485017

Cited by 4 publications

(1 citation statement)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Similar problems with charge accumulation in SEM measurements of nanopatterned polymers are commonly encountered by other researchers [12]. Even in the absence of charging effects, accurate determination of the dimensions and shape of nanopatterned polymers with SEM is a challenging multiparameter problem [13].…”

Section: Specimenmentioning

confidence: 65%

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

Wl¹,

Sa²,

Geiss³

et al. 2010

Nanotechnology

View full text Add to dashboard Cite

Elastic constants and cross-sectional dimensions of imprinted nanolines of poly(methyl methacrylate) (PMMA) on silicon substrates are determined nondestructively from finite-element inversion analysis of dispersion curves of hypersonic acoustic modes of these nanolines measured with Brillouin light scattering. The results for the cross-sectional dimensions, under the simplifying assumption of vertical sides and a semicircular top, are found to be consistent with dimensions determined from critical-dimension small-angle x-ray scattering measurements. The elastic constants C(11) and C(44) are found to be, respectively, 11.6% and 3.1% lower than their corresponding values for bulk PMMA. This result is consistent with the dimensional dependence of the quasi-static Young's modulus determined from buckling measurements on PMMA films with lower molecular weights. This study provides the first evidence of size-dependent effects on hypersonic elastic properties of polymers.

show abstract

Section: Specimenmentioning

confidence: 65%

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

Wl¹,

Sa²,

Geiss³

et al. 2010

Nanotechnology

View full text Add to dashboard Cite

show abstract

Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings

Jones

et al. 2004

Journal of Applied Physics

View full text Add to dashboard Cite

High-volume fabrication of nanostructures requires nondestructive metrologies capable of measuring not only the pattern size but also the pattern shape profile. Measurement tool requirements will become more stringent as the feature size approaches 50 nm and tolerances of pattern shape will reach a few nanometers. A small angle x-ray scattering (SAXS) based technique has been demonstrated to have the capability of characterizing the average pitch size and pattern width to subnanometer precision. In this study, we report a simple, modeling-free protocol to extract cross-section information such as the average sidewall angle and the pattern height of line grating patterns from the SAXS data. Diffraction peak intensities and reciprocal space positions are measured while the sample is rotated around the axis perpendicular to the grating direction. Linear extrapolations of peak positions in reciprocal space allow a precise determination of both the sidewall angle and the pattern height.

show abstract

Small angle x-ray scattering measurements of lithographic patterns with sidewall roughness from vertical standing waves

Wang

Jones

Lin

et al. 2007

Applied Physics Letters

View full text Add to dashboard Cite

Small angle x-ray scattering ͑SAXS͒ measurements are used to quantify the wavelength and amplitude of the sidewall roughness in a lithographic line:space pattern due to vertical standing waves present during the photoresist exposure. Analytic equations are derived to model the x-ray scattering intensity and are used to determine the periodicity and amplitude of the standing wave roughness. The average periodicity, or pitch, and the linewidth were L = 422± 1 nm and w 0 = 148± 1 nm. The period and amplitude of the standing wave roughness were s = 65± 1 nm and A s = 3.0± 0.5 nm. These results demonstrate the potential of SAXS measurements to quantify nondestructively and quantitatively dimensional deviations from an ideal structure.

show abstract

Accuracy in CD-SEM metrology

Cited by 4 publications

References 0 publications

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings

Small angle x-ray scattering measurements of lithographic patterns with sidewall roughness from vertical standing waves

Contact Info

Product

Resources

About